Doctor of Philosophy, Peking University (2018)
Bachelor of Science, Nanjing University (2013)
Monolithic optical microlithography of high-density elastic circuits.
Science (New York, N.Y.)
2021; 373 (6550): 88-94
Polymeric electronic materials have enabled soft and stretchable electronics. However, the lack of a universal micro/nanofabrication method for skin-like and elastic circuits results in low device density and limited parallel signal recording and processing ability relative to silicon-based devices. We present a monolithic optical microlithographic process that directly micropatterns a set of elastic electronic materials by sequential ultraviolet light-triggered solubility modulation. We fabricated transistors with channel lengths of 2 micrometers at a density of 42,000 transistors per square centimeter. We fabricated elastic circuits including an XOR gate and a half adder, both of which are essential components for an arithmetic logic unit. Our process offers a route to realize wafer-level fabrication of complex, high-density, and multilayered elastic circuits with performance rivaling that of their rigid counterparts.
View details for DOI 10.1126/science.abh3551
View details for PubMedID 34210882