R Pease
The William E. Ayer Professor in Electrical Engineering, Emeritus
Web page: http://web.stanford.edu/people/pease
Bio
See resume.doc
2023-24 Courses
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Independent Studies (4)
- Curricular Practical Training
APPPHYS 291 (Sum) - Directed Studies in Applied Physics
APPPHYS 290 (Aut, Win, Spr, Sum) - Special Studies and Reports in Electrical Engineering
EE 191 (Aut) - Special Studies or Projects in Electrical Engineering
EE 190 (Aut)
- Curricular Practical Training
All Publications
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Dielectric laser acceleration of sub-100 keV electrons with silicon dual-pillar grating structures
OPTICS LETTERS
2015; 40 (18): 4344-4347
Abstract
We present the demonstration of high-gradient laser acceleration and deflection of electrons with silicon dual-pillar grating structures using both evanescent inverse Smith-Purcell modes and coupled modes. Our devices accelerate subrelativistic 86.5 and 96.3 keV electrons by 2.05 keV over 5.6 μm distance for accelerating gradients of 370 MeV/m with a 3 nJ mode-locked Ti:sapphire laser. We also show that dual pillars can produce uniform accelerating gradients with a coupled-mode field profile. These results represent a significant step toward making practical dielectric laser accelerators for ultrafast, medical, and high-energy applications.
View details for DOI 10.1364/OL.40.004344
View details for Web of Science ID 000361556700040
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Laser acceleration and deflection of 96.3 keV electrons with a silicon dielectric structure
OPTICA
2015; 2 (2): 158-161
View details for DOI 10.1364/OPTICA.2.000158
View details for Web of Science ID 000354866800014
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Heat Transfer in Microchannels-2012 Status and Research Needs
JOURNAL OF HEAT TRANSFER-TRANSACTIONS OF THE ASME
2013; 135 (9)
View details for DOI 10.1115/1.4024354
View details for Web of Science ID 000326169800002
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Low-Temperature Monolithic Three-Layer 3-D Process for FPGA
IEEE ELECTRON DEVICE LETTERS
2013; 34 (8): 1044-1046
View details for DOI 10.1109/LED.2013.2266111
View details for Web of Science ID 000323911800037
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Thermally controlled alignment for wafer-scale lithography
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS
2013; 12 (3)
View details for DOI 10.1117/1.JMM.12.3.031109
View details for Web of Science ID 000324857000009
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Single Cell Profiling of Circulating Tumor Cells: Transcriptional Heterogeneity and Diversity from Breast Cancer Cell Lines
PLOS ONE
2012; 7 (5)
Abstract
To improve cancer therapy, it is critical to target metastasizing cells. Circulating tumor cells (CTCs) are rare cells found in the blood of patients with solid tumors and may play a key role in cancer dissemination. Uncovering CTC phenotypes offers a potential avenue to inform treatment. However, CTC transcriptional profiling is limited by leukocyte contamination; an approach to surmount this problem is single cell analysis. Here we demonstrate feasibility of performing high dimensional single CTC profiling, providing early insight into CTC heterogeneity and allowing comparisons to breast cancer cell lines widely used for drug discovery.We purified CTCs using the MagSweeper, an immunomagnetic enrichment device that isolates live tumor cells from unfractionated blood. CTCs that met stringent criteria for further analysis were obtained from 70% (14/20) of primary and 70% (21/30) of metastatic breast cancer patients; none were captured from patients with non-epithelial cancer (n = 20) or healthy subjects (n = 25). Microfluidic-based single cell transcriptional profiling of 87 cancer-associated and reference genes showed heterogeneity among individual CTCs, separating them into two major subgroups, based on 31 highly expressed genes. In contrast, single cells from seven breast cancer cell lines were tightly clustered together by sample ID and ER status. CTC profiles were distinct from those of cancer cell lines, questioning the suitability of such lines for drug discovery efforts for late stage cancer therapy.For the first time, we directly measured high dimensional gene expression in individual CTCs without the common practice of pooling such cells. Elevated transcript levels of genes associated with metastasis NPTN, S100A4, S100A9, and with epithelial mesenchymal transition: VIM, TGFß1, ZEB2, FOXC1, CXCR4, were striking compared to cell lines. Our findings demonstrate that profiling CTCs on a cell-by-cell basis is possible and may facilitate the application of 'liquid biopsies' to better model drug discovery.
View details for DOI 10.1371/journal.pone.0033788
View details for PubMedID 22586443
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Cooling Three-Dimensional Integrated Circuits using Power Delivery Networks
IEEE International Electron Devices Meeting (IEDM)
IEEE. 2012
View details for Web of Science ID 000320615600083
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Comment on "Ultrahigh secondary electron emission of carbon nanotubes" [Appl. Phys. Lett. 96, 213113, (2010)]
APPLIED PHYSICS LETTERS
2011; 98 (6)
View details for DOI 10.1063/1.3552975
View details for Web of Science ID 000287242100068
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Sub-15 nm Photo-electron Source Using a Nano-aperture Integrated with a Nano-antenna
Conference on Lasers and Electro-Optics (CLEO)
IEEE. 2011
View details for Web of Science ID 000295612403061
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Semiconductor crystal islands for three-dimensional integration
54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2010: C6P53-C6P58
View details for DOI 10.1116/1.3511473
View details for Web of Science ID 000285015200113
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Optical and computed evaluation of keyhole diffractive imaging for lensless x-ray microscopy
54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2010: C6Q1-C6Q5
View details for DOI 10.1116/1.3501340
View details for Web of Science ID 000285015200118
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Nondestructive detection of deviation in integrated circuits
54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2010: C6Q25-C6Q27
View details for DOI 10.1116/1.3518464
View details for Web of Science ID 000285015200121
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On the fabrication of three-dimensional silicon-on-insulator based optical phased array for agile and large angle laser beam steering systems
54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2010: C6O1-C6O7
View details for DOI 10.1116/1.3511508
View details for Web of Science ID 000285015200091
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Iterative phase recovery using wavelet domain constraints
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
2009; 27 (6): 3192-3195
View details for DOI 10.1116/1.3258632
View details for Web of Science ID 000272803400174
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Unequally Spaced Waveguide Arrays for Silicon Nanomembrane-Based Efficient Large Angle Optical Beam Steering
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS
2009; 15 (5): 1439-1446
View details for DOI 10.1109/JSTQE.2009.2021956
View details for Web of Science ID 000270950300022
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Isolating highly enriched populations of circulating epithelial cells and other rare cells from blood using a magnetic sweeper device
PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA
2009; 106 (10): 3970-3975
Abstract
The enumeration of rare circulating epithelial cells (CEpCs) in the peripheral blood of metastatic cancer patients has shown promise for improved cancer prognosis. Moving beyond enumeration, molecular analysis of CEpCs may provide candidate surrogate endpoints to diagnose, treat, and monitor malignancy directly from the blood samples. Thorough molecular analysis of CEpCs requires the development of new sample preparation methods that yield easily accessible and purified CEpCs for downstream biochemical assays. Here, we describe a new immunomagnetic cell separator, the MagSweeper, which gently enriches target cells and eliminates cells that are not bound to magnetic particles. The isolated cells are easily accessible and can be extracted individually based on their physical characteristics to deplete any cells nonspecifically bound to beads. We have shown that our device can process 9 mL of blood per hour and captures >50% of CEpCs as measured in spiking experiments. We have shown that the separation process does not perturb the gene expression of rare cells. To determine the efficiency of our platform in isolating CEpCs from patients, we have isolated CEpCs from all 47 tubes of 9-mL blood samples collected from 17 women with metastatic breast cancer. In contrast, we could not find any circulating epithelial cells in samples from 5 healthy donors. The isolated CEpCs are all stored individually for further molecular analysis.
View details for DOI 10.1073/pnas.0813188106
View details for Web of Science ID 000264036900059
View details for PubMedID 19234122
View details for PubMedCentralID PMC2645911
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Pulsed laser techniques for nanographoepitaxy
52nd International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2008: 2520–23
View details for DOI 10.1116/1.3013373
View details for Web of Science ID 000261385600129
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X-ray diffraction microscopy: Reconstruction with partial magnitude and spatial a priori information
52nd International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2008: 2362–66
View details for DOI 10.1116/1.3002487
View details for Web of Science ID 000261385600098
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Preferential orientation effects in partial melt laser crystallization of silicon
52nd International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2008: 2455–59
View details for DOI 10.1116/1.2998702
View details for Web of Science ID 000261385600116
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Prospects of free electron analog to digital technology
52nd International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2008: 2592–95
View details for DOI 10.1116/1.2991988
View details for Web of Science ID 000261385600144
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Photoemission from single-walled carbon nanotubes
JOURNAL OF APPLIED PHYSICS
2008; 104 (5)
View details for DOI 10.1063/1.2968457
View details for Web of Science ID 000259853600114
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Secondary electron detection for distributed axis electron beam systems
MICROELECTRONIC ENGINEERING
2008; 85 (8): 1786-1791
View details for DOI 10.1016/j.mee.2008.05.021
View details for Web of Science ID 000258714000021
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Spatial Quantized Analog-to-Digital Conversion Based on Optical Beam-Steering
JOURNAL OF LIGHTWAVE TECHNOLOGY
2008; 26 (13-16): 2219-2226
View details for DOI 10.1109/JLT.2008.922292
View details for Web of Science ID 000260874000057
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Demonstration of secondary electron detection using monolithic multi-channel electron detector
20th International Microprocesses and Nanotechnology Conference
JAPAN SOC APPLIED PHYSICS. 2008: 4913–17
View details for DOI 10.1143/JJAP.47.4913
View details for Web of Science ID 000257260500014
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Lithography and other patterning techniques for future electronics
PROCEEDINGS OF THE IEEE
2008; 96 (2): 248-270
View details for DOI 10.1109/JPROC.2007.911853
View details for Web of Science ID 000252583700006
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Significant advances in scanning electron microscopes (1965-2007)
ADVANCES IN IMAGING AND ELECTRON PHYSICS, VOL 150
2008; 150: 53-86
View details for DOI 10.1016/S1076-5670(07)00002-X
View details for Web of Science ID 000254216500002
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Real time simulation of heat detection in DNA Thermosequencing
3rd IEEE Sensors Applications Symposium
IEEE. 2008: 89–94
View details for Web of Science ID 000256382600020
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Rapid partial melt crystallization of silicon for monolithic three-dimensional integration
51st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2007: 1989–92
View details for DOI 10.1116/1.2798732
View details for Web of Science ID 000251611900041
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Monolithic multichannel secondary electron detector for distributed axis electron beam lithography and inspection
51st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2007: 2277–83
View details for DOI 10.1116/1.2804611
View details for Web of Science ID 000251611900102
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Economic approximate models for backscattered electrons
51st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2007: 2425–29
View details for DOI 10.1116/1.2794068
View details for Web of Science ID 000251611900132
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Metal-semiconductor-metal electron detectors
51st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2007: 2077–80
View details for DOI 10.1116/1.2798745
View details for Web of Science ID 000251611900061
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CsBr/GaN heterojunction photoelectron source
51st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2007: 2266–70
View details for DOI 10.1116/1.2779042
View details for Web of Science ID 000251611900100
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High current density GaN/CsBr heterojunction photocathode with improved photoyield
APPLIED PHYSICS LETTERS
2007; 90 (23)
View details for DOI 10.1063/1.2746959
View details for Web of Science ID 000247145500015
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Lamellar crystallization of silicon for 3-dimensional integration
32nd International Conference on Micro- and Nano-Engineering
ELSEVIER SCIENCE BV. 2007: 1186–89
View details for DOI 10.1016/j.mee.2007.01.249
View details for Web of Science ID 000247182500116
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Nano-graphoepitaxy of semiconductors for 3D integration
32nd International Conference on Micro- and Nano-Engineering
ELSEVIER SCIENCE BV. 2007: 891–94
View details for DOI 10.1016/j.mee.2007.01.067
View details for Web of Science ID 000247182500047
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Low thermal budget processing for sequential 3-D IC fabrication
IEEE TRANSACTIONS ON ELECTRON DEVICES
2007; 54 (4): 707-714
View details for DOI 10.1109/TED.2007.891300
View details for Web of Science ID 000245327900013
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Computational scanning electron microscopy
International Conference on Frontiers of Characterization and Metrology for Nanoelectronics
AMER INST PHYSICS. 2007: 512–517
View details for Web of Science ID 000250957600085
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Field-electron emission from single-walled carbon nanotubes lying on a surface
2007 CANADIAN CONFERENCE ON ELECTRICAL AND COMPUTER ENGINEERING, VOLS 1-3
2007: 1294-1297
View details for Web of Science ID 000259117300320
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Traveling wave spatial quantized analog-to-digital conversion
IEEE/MTT-S International Microwave Symposium
IEEE. 2007: 225–228
View details for Web of Science ID 000250827400052
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Optical Spatially Quantized High Performance Analog-to-digital Conversion
Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference
IEEE. 2007: 987–988
View details for Web of Science ID 000268751000496
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High-speed scanning electron Microscopy using distributed-axis electron optics
20th International Microprocesses and Nanotechnology Conference
JAPAN SOCIETY APPLIED PHYSICS. 2007: 414–415
View details for Web of Science ID 000253841100206
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Effect of nanoimprinted surface relief on Si and Ge nucleation and ordering
6th International Workshop on Epitaxial Semiconductors on Patterned Substrates and Novel Index Surfaces (ESPS-NIS 2006)
ELSEVIER SCI LTD. 2006: 1481–85
View details for DOI 10.1016/j.mejo.2006.05.023
View details for Web of Science ID 000242907400013
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Pattern reconstruction of scanning electron microscope images using long-range content complexity analysis of the edge ridge signal
50th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2006: 3110–14
View details for DOI 10.1116/1.2363408
View details for Web of Science ID 000243324400115
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Alkylsiloxane self-assembled monolayer formation guided by nanoimprinted Si and SiO2 templates
APPLIED PHYSICS LETTERS
2006; 89 (15)
View details for DOI 10.1063/1.2360920
View details for Web of Science ID 000241247900113
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CsBr photocathode at 257 nm: A rugged high current density electron source
APPLIED PHYSICS LETTERS
2006; 89 (11)
View details for DOI 10.1063/1.2354029
View details for Web of Science ID 000240545400014
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Shot noise models for sequential processes and the role of lateral mixing
49th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2006: 1902–8
View details for DOI 10.1116/1.2218875
View details for Web of Science ID 000239890000036
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Parameters and mechanisms governing image contrast in scanning electron microscopy of single-walled carbon nanotubes
SCANNING
2006; 28 (4): 219-227
Abstract
Image formation of single-walled carbon nanotubes (SWNTs) in the scanning electron microscope (SEM) is peculiarly sensitive to primary electron landing energy, imaging history, sample/substrate geometry, electrical conductivity, sample contamination, and substrate charging. This sensitivity is probably due to the extremely small interaction volume of the SWNTs' monolayered, nanoscale structures with the electron beam. Traditional electron beam/bulk specimen interaction models appear unable to explain the contrast behavior when directly applied to SWNTs. We present one systematic case study of SWNT SEM imaging with special attention to the above parameters and propose some physical explanations for the effect of each. We also demonstrate that it is possible to employ voltage biasing to counteract this extrinsic behavior, gain better control of the image contrast, and facilitate the interpretation of SWNT images in the SEM.
View details for Web of Science ID 000239952200004
View details for PubMedID 16898669
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Direct, in-scanner, aerial image sensing
31st International Conference on Micro- and Nano-Engineering
ELSEVIER SCIENCE BV. 2006: 1030–35
View details for DOI 10.1016/j.mee.2006.01.266
View details for Web of Science ID 000237581900097
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Ab initio modeling of the interaction of electron beams and single-walled carbon nanotubes
PHYSICAL REVIEW LETTERS
2006; 96 (5)
Abstract
Single-walled carbon nanotubes are readily observable in a scanning electron microscope, which traditional models fail to explain. We present an ab initio model to explain how the electron beam can interact with these structures despite the very small, nanoscale, interaction volume. In particular, we show how the electron beam can generate very strong secondary electron emission from the tip of a nanotube under external electric field. The approach may also be used in modeling the interaction of charged particles with nanostructures in other applications such as electron detection.
View details for DOI 10.1103/PhysRevLett.96.056802
View details for Web of Science ID 000235252200065
View details for PubMedID 16486969
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Segmentation-assisted edge extraction algorithms for SEM images
26th Annual BACUS Symposium on Photomask Technology
SPIE-INT SOC OPTICAL ENGINEERING. 2006
View details for DOI 10.1117/12.691464
View details for Web of Science ID 000243620500050
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Narrow cone emission from negative electron affinity photocathodes
49th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2005: 2758–62
View details for DOI 10.1116/1.2101726
View details for Web of Science ID 000234613200092
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Reconstruction of pattern images from scanning electron microscope images
49th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2005: 3080–84
View details for DOI 10.1116/1.2127944
View details for Web of Science ID 000234613200156
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Self inspection of integrated circuits pattern defects using support vector machines
49th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2005: 3085–89
View details for DOI 10.1116/1.2062434
View details for Web of Science ID 000234613200157
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Maskless lithography
30th International Conference on Micro and Nano Engineering
ELSEVIER SCIENCE BV. 2005: 381–392
View details for DOI 10.1016/j.mee.2005.01.009
View details for Web of Science ID 000228589700064
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Distributed-axis electron beam optics for fast inspection
16th Annual Scanning Conference
WILEY-BLACKWELL. 2005: 67–67
View details for Web of Science ID 000227848800014
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Parameters and mechanisms governing image contrast in the scanning electron microscopy of carbon nanotubes
16th Annual Scanning Conference
WILEY-BLACKWELL. 2005: 87–88
View details for Web of Science ID 000227848800044
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Photoelectronic analog-to-digital conversion: Sampling and quantizing at 100 Gs/s
IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES
2005; 53 (1): 336-342
View details for DOI 10.1109/TMTT.2004.839923
View details for Web of Science ID 000226343600038
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Subpicosecond jitter in picosecond electron bunches
48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2005: 196–200
View details for Web of Science ID 000227300900036
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Electron beam stimulated field-emission from single-walled carbon nanotubes
48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2004: 3124–27
View details for DOI 10.1116/1.1809628
View details for Web of Science ID 000226439800104
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Reaching for the bottom: The evolution of EIPBN
48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2004: 2882–84
View details for DOI 10.1116/1.1828088
View details for Web of Science ID 000226439800055
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Dynamic self-inspection of integrated circuit pattern defects
48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2004: 3373–77
View details for DOI 10.1116/1.1824049
View details for Web of Science ID 000226439800158
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Electric-field-directed growth of carbon nanotubes in two dimensions
48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2004: 3421–25
View details for DOI 10.1116/1.1821578
View details for Web of Science ID 000226439800168
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Self-inspection of IC pattern defects
48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2004: 3386–89
View details for DOI 10.1116/1.1809627
View details for Web of Science ID 000226439800161
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Electron scattering study within the depletion region of the GaN(0001) and the GaAs(100) surface
APPLIED PHYSICS LETTERS
2004; 85 (9): 1541-1543
View details for DOI 10.1063/1.1785865
View details for Web of Science ID 000223555000031
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Scanning electron microscopy of field-emitting individual single-walled carbon nanotubes
APPLIED PHYSICS LETTERS
2004; 85 (1): 112-114
View details for DOI 10.1063/1.1763984
View details for Web of Science ID 000222360300038
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Induced thermal stress fields for three-dimensional distortion control of Si wafer topography
REVIEW OF SCIENTIFIC INSTRUMENTS
2004; 75 (6): 1997-2002
View details for DOI 10.1063/1.1753101
View details for Web of Science ID 000221793800010
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Electrical test structures for mapping nanometer-scale pattern placement errors
47th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2004: 12–15
View details for DOI 10.1116/1.1633279
View details for Web of Science ID 000220573800004
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Towards higher-resolution scanning electron microscopy
ADVANCES IN IMAGING AND ELECTRON PHYSICS, VOL 133
2004; 133: 187-193
View details for Web of Science ID 000227596100015
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Effect of oxygen adsorption on the efficiency of magnesium photocathodes
47th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2003: 2830–33
View details for DOI 10.1116/1.1624265
View details for Web of Science ID 000188193600100
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Distributed axis electron beam technology for maskless lithography and defect inspection
47th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2003: 2834–38
View details for DOI 10.1116/1.1629291
View details for Web of Science ID 000188193600101
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Photoelectronic analog-to-digital conversion using miniature electron optics: Basic design considerations
47th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2003: 2826–29
View details for DOI 10.1116/1.1621664
View details for Web of Science ID 000188193600099
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Electron beam induced conductivity in poly(methylmethacrylate) and SiO2 thin films
47th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2003: 2638–44
View details for DOI 10.1116/1.1618237
View details for Web of Science ID 000188193600064
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Transient temperature measurements of resist heating using nanothermocouples
47th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2003: 2985–89
View details for DOI 10.1116/1.1624255
View details for Web of Science ID 000188193600133
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A carbon nanotube cross structure as a nanoscale quantum device
NANO LETTERS
2003; 3 (9): 1187-1190
View details for DOI 10.1021/nl034278b
View details for Web of Science ID 000185330700003
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Optimization and characterization of III-V surface cleaning
15th International Vacuum Microelectronics Conference (IVMC)
A V S AMER INST PHYSICS. 2003: 1953–58
View details for DOI 10.1116/1.1593644
View details for Web of Science ID 000185080000140
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Low frequency noise in sub-100 nm MOSFETs
4th International Symposium on Nanostructures and Mesoscopic Systems (NanoMES 2003)
ELSEVIER SCIENCE BV. 2003: 13–17
View details for DOI 10.1016/S1386-9477(03)00286-8
View details for Web of Science ID 000184664000003
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Oxygen species in Cs/O activated gallium nitride (GaN) negative electron affinity photocathodes
15th International Vacuum Microelectronics Conference (IVMC)
A V S AMER INST PHYSICS. 2003: 1863–69
View details for DOI 10.1116/1.1589512
View details for Web of Science ID 000185080000124
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Transient measurement of resist charging during electron beam exposure
46th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN)
A V S AMER INST PHYSICS. 2003: 106–11
View details for DOI 10.1116/1.1534571
View details for Web of Science ID 000182603900021
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Preparation of clean GaAs(100) studied by synchrotron radiation photoemission
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
2003; 21 (1): 212-218
View details for DOI 10.1116/1.1532737
View details for Web of Science ID 000182598200031
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Thin film nano thermocouple sensors for applications in laser and electron beam irradiation
12th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS 03)
IEEE. 2003: 1112–1115
View details for Web of Science ID 000184567300279
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Role of oxygen in semiconductor negative electron affinity photocathodes
46th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN)
A V S AMER INST PHYSICS. 2002: 2721–25
View details for DOI 10.1116/1.1521742
View details for Web of Science ID 000180307300093
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Submicron thermocouple measurements of electron-beam resist heating
46th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN)
A V S AMER INST PHYSICS. 2002: 3044–46
View details for DOI 10.1116/1.1523023
View details for Web of Science ID 000180307300159
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Distributed axis electron-beam system for lithography and inspection - preliminary experimental results
46th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN)
A V S AMER INST PHYSICS. 2002: 2662–65
View details for DOI 10.1116/1.1520566
View details for Web of Science ID 000180307300080
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Correcting for global space charge by positive ion generation
46th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN)
A V S AMER INST PHYSICS. 2002: 2709–12
View details for DOI 10.1116/1.1523398
View details for Web of Science ID 000180307300090
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Simple method for cleaning gallium nitride (0001)
49th International Symposium of the American-Vacuum-Society
A V S AMER INST PHYSICS. 2002: 1784–86
View details for DOI 10.116/1.11503782
View details for Web of Science ID 000178146700041
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Semiconductor technology - Imprints offer moore
NATURE
2002; 417 (6891): 802-803
View details for Web of Science ID 000176285600030
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High-throughput mapping of short-range spatial variations using active electrical metrology
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
2002; 15 (1): 108-117
View details for Web of Science ID 000173843400013
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Modeling resist heating in mask fabrication using a multilayer Green's function approach.
Conference on Metrology, Inspection, and Process Control for Microlithography XVI
SPIE-INT SOC OPTICAL ENGINEERING. 2002: 206–212
View details for Web of Science ID 000178071700021
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Stochastic Coulomb interaction effect in ion-neutralized electron-beam projection optics
45th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2001: 2572–80
View details for Web of Science ID 000173159900100
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Characterization of multicusp-plasma ion source brightness using micron-scale apertures
45th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2001: 2602–6
View details for Web of Science ID 000173159900105
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Thermal conductivity measurements of thin-film resist
45th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
A V S AMER INST PHYSICS. 2001: 2874–77
View details for Web of Science ID 000173159900162
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Simulation of space charge neutralization using ions in electron beam projection optics
26th International Conference on Micro- and Nano-Engineering
ELSEVIER SCIENCE BV. 2001: 231–238
View details for Web of Science ID 000171061800031
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High-speed mapping of inter-transistor overlay variations using active electrical metrology
Conference on Metrology, Inspection, and Process Control for Microlithography XV
SPIE-INT SOC OPTICAL ENGINEERING. 2001: 506–514
View details for Web of Science ID 000172533300053
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Prospect for high brightness III-nitride electron emitter
44th International Conference on Electron Ion and Photon Beam Technology and Nanofabrication (EIPBN)
A V S AMER INST PHYSICS. 2000: 3042–46
View details for Web of Science ID 000165935800081
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Scaled measurements of global space-charge induced image blur in electron beam projection system
44th International Conference on Electron Ion and Photon Beam Technology and Nanofabrication (EIPBN)
A V S AMER INST PHYSICS. 2000: 2999–3003
View details for Web of Science ID 000165935800074
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Prospects for charged particle lithography as a manufacturing technology
25th International Conference on Micro- and Nano-Engineering
ELSEVIER SCIENCE BV. 2000: 55–60
View details for Web of Science ID 000088603300008
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Field size versus column shortness in high throughput electron beam lithography
43rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 99)
A V S AMER INST PHYSICS. 1999: 2830–35
View details for Web of Science ID 000084282800081
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Space-charge-induced aberrations
43rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 99)
A V S AMER INST PHYSICS. 1999: 2803–7
View details for Web of Science ID 000084282800075
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Maskless extreme ultraviolet lithography
43rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 99)
A V S AMER INST PHYSICS. 1999: 3047–51
View details for Web of Science ID 000084282800127
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High-throughput, high-spatial-frequency measurement of critical dimension variations using memory circuits as electrical test structures
43rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 99)
A V S AMER INST PHYSICS. 1999: 2707–13
View details for Web of Science ID 000084282800055
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Charging and discharging of electron beam resist films
43rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 99)
A V S AMER INST PHYSICS. 1999: 2893–96
View details for Web of Science ID 000084282800094
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Global space charge effects in high throughput electron beam lithography
SPIE Conference on Charged Particle Optics IV
SPIE-INT SOCIETY OPTICAL ENGINEERING. 1999: 192–214
View details for Web of Science ID 000084509300021
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Multiplexed blanker array for parallel electron beam lithography
42nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN)
A V S AMER INST PHYSICS. 1998: 3174–76
View details for Web of Science ID 000077542300047
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Performance investigation of Coulomb interaction-limited high through put electron beam lithography based on empirical modeling
42nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN)
A V S AMER INST PHYSICS. 1998: 3215–20
View details for Web of Science ID 000077542300056
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Lifetime and reliability results for a negative electron affinity photocathode in a demountable vacuum system
42nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN)
A V S AMER INST PHYSICS. 1998: 3380–84
View details for Web of Science ID 000077542300087
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Economical sampling algorithm using Fourier analysis for mapping wafer critical dimension variations
42nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN)
A V S AMER INST PHYSICS. 1998: 3655–60
View details for Web of Science ID 000077542300141
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Patterned negative electron affinity photocathodes for maskless electron beam lithography
42nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN)
A V S AMER INST PHYSICS. 1998: 3192–96
View details for Web of Science ID 000077542300051
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Performance of adaptive alignment method on asymmetric signals
42nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN)
A V S AMER INST PHYSICS. 1998: 3637–41
View details for Web of Science ID 000077542300137
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The micromechanical tunneling transistor
JOURNAL OF MICROMECHANICS AND MICROENGINEERING
1998; 8 (3): 209-212
View details for Web of Science ID 000076105300006
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Analysis of the performance limitations from Coulomb interaction in maskless parallel electron beam lithography systems
Conference on Emerging Lithographic Technologies II
SPIE - INT SOC OPTICAL ENGINEERING. 1998: 292–301
View details for Web of Science ID 000075329300031
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Application of the Brewster angle illumination technique to eliminate resist-induced alignment errors
Optical Microlithography XI Conference
SPIE - INT SOC OPTICAL ENGINEERING. 1998: 951–957
View details for Web of Science ID 000075411800092
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Resist charging in electron-beam lithography
18th Annual BACUS Symposium on Photomask Technology and Management
SPIE - INT SOC OPTICAL ENGINEERING. 1998: 383–388
View details for Web of Science ID 000078742500038
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Exploiting structure in positioning of non-symmetric signals
IEEE International Conference on Acoustics, Speech and Signal Processing (ICASSP 98)
IEEE. 1998: 1913–1916
View details for Web of Science ID 000074520700479
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High accuracy alignment based on subspace decomposition
Optical Microlithography XI Conference
SPIE - INT SOC OPTICAL ENGINEERING. 1998: 502–509
View details for Web of Science ID 000075411800046
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Obtaining a physical two-dimensional Cartesian reference
41st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN)
A V S AMER INST PHYSICS. 1997: 2173–76
View details for Web of Science ID 000071103100054
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Minimum emission current of liquid metal ion sources
41st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN)
A V S AMER INST PHYSICS. 1997: 2332–36
View details for Web of Science ID 000071103100087
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Practical approach to separating the pattern generator-induced mask CD errors from the blank/process-induce mask CD errors using conventional market measurements
41st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN)
A V S AMER INST PHYSICS. 1997: 2243–48
View details for Web of Science ID 000071103100069
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Blanked aperture array for parallel electron beam lithography
41st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN)
A V S AMER INST PHYSICS. 1997: 2289–92
View details for Web of Science ID 000071103100078
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Accurate alignment on asymmetrical signals
41st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN)
A V S AMER INST PHYSICS. 1997: 2185–88
View details for Web of Science ID 000071103100057
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Novel objective lens for low voltage electron beam imaging
41st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN)
A V S AMER INST PHYSICS. 1997: 2737–41
View details for Web of Science ID 000071103100165
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Neural network model for global alignment incorporating wafer and stage distortion
41st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN)
A V S AMER INST PHYSICS. 1997: 2146–50
View details for Web of Science ID 000071103100049
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Semiconductor on glass photocathodes for high throughput maskless electron beam lithography
41st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN)
A V S AMER INST PHYSICS. 1997: 2707–12
View details for Web of Science ID 000071103100159
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Optimal coherent decompositions for radially symmetric optical systems
41st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN)
A V S AMER INST PHYSICS. 1997: 2412–16
View details for Web of Science ID 000071103100104
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Improved heat sinking for laser-diode arrays using microchannels in CVD diamond
IEEE TRANSACTIONS ON COMPONENTS PACKAGING AND MANUFACTURING TECHNOLOGY PART B-ADVANCED PACKAGING
1997; 20 (1): 104-109
View details for Web of Science ID A1997WH03400014
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Exploiting structure in fast aerial image computation for integrated circuit patterns
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
1997; 10 (1): 62-74
View details for Web of Science ID A1997WG84200007
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Fabrication of silicon nanopillars containing polycrystalline silicon/insulator multilayer structures
APPLIED PHYSICS LETTERS
1997; 70 (3): 333-335
View details for Web of Science ID A1997WC83200020
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An exact algorithm for self-calibration of two-dimensional precision metrology stages
PRECISION ENGINEERING-JOURNAL OF THE AMERICAN SOCIETY FOR PRECISION ENGINEERING
1997; 20 (1): 16-32
View details for Web of Science ID A1997XC22300002
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A new approach to global alignment in IC manufacturing based on a neural network model
Conference on Optical Microlithography X
SPIE - INT SOC OPTICAL ENGINEERING. 1997: 629–642
View details for Web of Science ID A1997BJ23K00061
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Patterned media: A viable route to 50 Gbit/in(2) and up for magnetic recording?
7th Annual Magnetic Recording Conference (TMRC) on Media
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC. 1997: 990–95
View details for Web of Science ID A1997WF01300049
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Minimizing alignment error induced by asymmetric resist coating
40th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN)
A V S AMER INST PHYSICS. 1996: 3980–84
View details for Web of Science ID A1996VZ36100112
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Energy spread in liquid metal ion sources at low currents
40th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN)
A V S AMER INST PHYSICS. 1996: 3911–15
View details for Web of Science ID A1996VZ36100097
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Semiconductor on glass photocathodes as high-performance sources for parallel electron beam lithography
40th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN)
A V S AMER INST PHYSICS. 1996: 3782–86
View details for Web of Science ID A1996VZ36100071
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Micro-objective lens with compact secondary electron detector for miniature low voltage electron beam systems
40th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN)
A V S AMER INST PHYSICS. 1996: 3738–41
View details for Web of Science ID A1996VZ36100063
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Structure in thin and ultrathin spin-cast polymer films
SCIENCE
1996; 273 (5277): 912-915
View details for Web of Science ID A1996VC67000040
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Switching characteristics of submicron cobalt islands
JOURNAL OF APPLIED PHYSICS
1996; 80 (1): 342-346
View details for Web of Science ID A1996UU53200052
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Magnetic force microscopy of single-domain single-crystal iron particles with uniaxial surface anisotropy
40th Annual Conference on Magnetism and Magnetic Materials
AMER INST PHYSICS. 1996: 5851–53
View details for Web of Science ID A1996UG87800094
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Lithographically patterned single-domain cobalt islands for high-density magnetic recording
6th International Conference on Magnetic Recording Media
ELSEVIER SCIENCE BV. 1996: 140–45
View details for Web of Science ID A1996UU48500043
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Self-calibration in two-dimensions: The experiment
10th Annual SPIE Conference on Metrology, Inspection, and Process Control for Microlithography
SPIE - INT SOC OPTICAL ENGINEERING. 1996: 130–146
View details for Web of Science ID A1996BF92W00013
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Can nanolithography ever be a manufacturing technology?
1st International Conference on Low Dimensional Structures and Devices
ELSEVIER SCIENCE SA. 1995: 188–91
View details for Web of Science ID A1995TM63000039
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Field distortion characterization using linewidth or pitch measurement
39th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN)
A V S AMER INST PHYSICS. 1995: 2904–8
View details for Web of Science ID A1995TN81600152
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Adaptive metrology: An economical strategy for judging the acceptability of a mask pattern
39th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN)
A V S AMER INST PHYSICS. 1995: 2642–47
View details for Web of Science ID A1995TN81600097
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EFFECT OF MAGNETOCRYSTALLINE ANISOTROPY IN SINGLE-DOMAIN POLYCRYSTALLINE COBALT ISLANDS
1995 IEEE International Magnetics Conference (INTERMAG 95)
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC. 1995: 3805–7
View details for Web of Science ID A1995TD55800118
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RESIST CHARGING IN ELECTRON-BEAM LITHOGRAPHY
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1995; 13 (5): 1979-1983
View details for Web of Science ID A1995TA46600008
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GROWTH OF SINGLE DIAMOND CRYSTALLITES AROUND NANOMETER-SCALE SILICON WIRES
APPLIED PHYSICS LETTERS
1995; 67 (7): 909-911
View details for Web of Science ID A1995RN57500011
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A REVIEW OF MASK ERRORS ON A VARIETY OF PATTERN GENERATORS
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
1995; 8 (3): 319-325
View details for Web of Science ID A1995RM52400013
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LOW-ENERGY-ELECTRON ATOM ELASTIC-SCATTERING CROSS-SECTIONS FROM 0.1-30 KEV
SCANNING
1995; 17 (4): 250-253
View details for Web of Science ID A1995RN80300007
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PENETRATION DEPTH AND CRITICAL-CURRENT IN NBN RESONATORS - PREDICTING NONLINEARITIES AND BREAKDOWN IN MICROSTRIP
1994 Applied Superconductivity Conference
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC. 1995: 1975–78
View details for Web of Science ID A1995RP63700206
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PHYSICAL AND MAGNETIC-PROPERTIES OF SUBMICRON LITHOGRAPHICALLY PATTERNED MAGNETIC ISLANDS
3rd International Conference on Nanometer-Scale Science and Technology
A V S AMER INST PHYSICS. 1995: 1089–94
View details for Web of Science ID A1995RD49400048
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IMPROVED RETARDING-FIELD OPTICS VIA IMAGE OUTSIDE FIELD
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1995; 13 (3): 826-832
View details for Web of Science ID A1995RD49400004
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Negative electron affinity photocathodes as high-performance electron sources .1. Achievement of ultra-high brightness from an NEA photocathode
Conference on Electron-Beam Sources and Charged-Particle Optics
SPIE - INT SOC OPTICAL ENGINEERING. 1995: 208–219
View details for Web of Science ID A1995BE29C00020
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Resist charging in electron beam lithography
15th Annual Symposium on Photomask Technology and Management
SPIE - INT SOC OPTICAL ENGINEERING. 1995: 516–526
View details for Web of Science ID A1995BE81K00049
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Negative electron affinity photocathodes as high-performance electron sources .2. Energy spectrum measurements
Photodetectors and Power Meters II Conference
SPIE-INT SOC OPTICAL ENGINEERING. 1995: 189–196
View details for Web of Science ID A1995BE29H00021
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Does 0.1 micron equal mach 1?
Symposium on Materials-Fabrication and Patterning at the Nanoscale
MATERIALS RESEARCH SOC. 1995: 165–171
View details for Web of Science ID A1995BE33M00022
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Retarding field optics with field-free sample
Conference on Electron-Beam Sources and Charged-Particle Optics
SPIE - INT SOC OPTICAL ENGINEERING. 1995: 44–53
View details for Web of Science ID A1995BE29C00005
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High-performance negative electron affinity photocathodes for high resolution electron beam lithography and metrology
1995 International Electron Devices Meeting
IEEE. 1995: 409–412
View details for Web of Science ID A1995BF10D00091
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CHARACTERIZATION OF IN-SITU VARIABLE-ENERGY FOCUSED ION BEAM/MBE MQW STRUCTURES
21st International Symposium on Compound Semiconductors
IOP PUBLISHING LTD. 1995: 359–62
View details for Web of Science ID A1995BC92S00066
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2X2-PHASE MASK FOR ARBITRARY PATTERN-FORMATION
7th International MicroProcess Conference (MPC 94)/1994 International Electron Device and Materials Symposium (1994 EDMS)
INST PURE APPLIED PHYSICS. 1994: 6790–95
View details for Web of Science ID A1994RX26300008
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SUBMICRON PATTERNING OF THIN COBALT FILMS FOR MAGNETIC STORAGE
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1994; 12 (6): 3196-3201
View details for Web of Science ID A1994PY13300020
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QUARTER-MICRON LITHOGRAPHY WITH A GAPPED MARKLE-DYSON SYSTEM
38th International Symposium on Electron, Ion and Photon Beams
AMER INST PHYSICS. 1994: 3809–13
View details for Web of Science ID A1994PY13300142
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CHARACTERIZATION OF A 193 NM OPTICAL LITHOGRAPHY SYSTEM FOR 0.18 MU-M AND BELOW
38th International Symposium on Electron, Ion and Photon Beams
AMER INST PHYSICS. 1994: 3814–19
View details for Web of Science ID A1994PY13300143
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SPATIAL-FREQUENCY FILTERING USING MULTIPLE-PASS PRINTING
38th International Symposium on Electron, Ion and Photon Beams
AMER INST PHYSICS. 1994: 3455–59
View details for Web of Science ID A1994PY13300070
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EMPIRICAL FORMS FOR THE ELECTRON-ATOM ELASTIC-SCATTERING CROSS-SECTIONS FROM 0.1 TO 30 KEV
JOURNAL OF APPLIED PHYSICS
1994; 76 (4): 2016-2022
View details for Web of Science ID A1994PC02100002
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LIMITS OF HIGH-DENSITY, LOW-FORCE PRESSURE CONTACTS
International Electronics Manufacturing Symposium
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC. 1994: 257–62
View details for Web of Science ID A1994NZ21800011
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WORKPIECE CHARGING IN ELECTRON-BEAM LITHOGRAPHY
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1994; 12 (3): 1367-1371
View details for Web of Science ID A1994NR91800007
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SELF-LIMITING OXIDATION FOR FABRICATING SUB-5 NM SILICON NANOWIRES
APPLIED PHYSICS LETTERS
1994; 64 (11): 1383-1385
View details for Web of Science ID A1994NA49600024
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THE ROLE OF RESIDUAL CASTING SOLVENT IN DISSOLUTION BEHAVIOR OF POLY(3-METHYL-4-HYDROXYSTYRENE) FILMS
Advances in Resist Technology and Processing XI Conference/SPIE 1994 Symposium on Microlithography
SPIE - INT SOC OPTICAL ENGINEERING. 1994: 596–609
View details for Web of Science ID A1994BA89Y00051
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2-LEVEL MASKS FOR INCREASED DEPTH OF FOCUS
14th Annual BACUS Symposium on Photomask Technology and Management
SPIE - INT SOC OPTICAL ENGINEERING. 1994: 392–399
View details for Web of Science ID A1994BC27M00038
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OPTIMIZATION OF PUPIL FILTERS FOR INCREASED DEPTH OF FOCUS
6th (5th International) MicroProcess Conference (MPC 93)
JAPAN SOC APPLIED PHYSICS. 1993: 5850–55
View details for Web of Science ID A1993MQ76100006
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THE EFFECT OF GAPS IN MARKLE-DYSON OPTICS FOR SUB-QUARTER-MICRON LITHOGRAPHY
6th (5th International) MicroProcess Conference (MPC 93)
JAPAN SOC APPLIED PHYSICS. 1993: 5840–44
View details for Web of Science ID A1993MQ76100004
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SELF-LIMITING OXIDATION OF SI NANOWIRES
37th International Symposium on Electron, Ion, and Photon Beams
A V S AMER INST PHYSICS. 1993: 2532–37
View details for Web of Science ID A1993MM97200108
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IMAGE MONITOR FOR MARKLE-DYSON OPTICS
37th International Symposium on Electron, Ion, and Photon Beams
A V S AMER INST PHYSICS. 1993: 2700–2704
View details for Web of Science ID A1993MM97200143
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OPTICAL PROJECTION SYSTEM FOR GIGABIT DYNAMIC RANDOM-ACCESS MEMORIES
37th International Symposium on Electron, Ion, and Photon Beams
A V S AMER INST PHYSICS. 1993: 2675–79
View details for Web of Science ID A1993MM97200138
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HIGH-ASPECT-RATIO LINES AS LOW DISTORTION, HIGH-FREQUENCY OFF-CHIP INTERCONNECTS
IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY
1993; 16 (7): 692-698
View details for Web of Science ID A1993MJ55700011
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LIMITS OF HIGH-DENSITY, LOW-FORCE PRESSURE CONTACTS
15th IEEE/CHMT International Electronics Manufacturing Technology (IEMT) Symposium: Electronics Manufacturing for the year 2000
I E E E. 1993: 136–140
View details for Web of Science ID A1993BZ64F00022
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LIMITS OF ULTRAVIOLET LITHOGRAPHY
OSA Topical Meeting on Soft X-Ray Projection Lithography
OPTICAL SOC AMERICA. 1993: 6–9
View details for Web of Science ID A1993BA05Y00002
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REPAIR OF PHASE-SHIFT MASKS USING LOW-ENERGY FOCUSED ION-BEAMS
5TH ( 4TH INTERNATIONAL ) MICROPROCESS CONF ( MPC 92 )
JAPAN J APPLIED PHYSICS. 1992: 4474–78
View details for Web of Science ID A1992KJ15500066
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PRESENT AND FUTURE-TRENDS IN MICROLITHOGRAPHY
5TH ( 4TH INTERNATIONAL ) MICROPROCESS CONF ( MPC 92 )
JAPAN J APPLIED PHYSICS. 1992: 4103–9
View details for Web of Science ID A1992KJ15500001
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EFFECT ON SCALING OF HEAT REMOVAL REQUIREMENTS IN 3-DIMENSIONAL SYSTEMS
INTERNATIONAL JOURNAL OF ELECTRONICS
1992; 73 (6): 1227-1232
View details for Web of Science ID A1992KH97900013
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LOW-VOLTAGE ALTERNATIVE FOR ELECTRON-BEAM LITHOGRAPHY
36TH ANNUAL INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS
AMER INST PHYSICS. 1992: 3094–98
View details for Web of Science ID A1992KM50000147
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DEPTH OF FOCUS ENHANCEMENT IN OPTICAL LITHOGRAPHY
36TH ANNUAL INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS
AMER INST PHYSICS. 1992: 3047–54
View details for Web of Science ID A1992KM50000139
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OXIDATION OF SUB-50 NM SI COLUMNS FOR LIGHT-EMISSION STUDY
36TH ANNUAL INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS
AMER INST PHYSICS. 1992: 2846–50
View details for Web of Science ID A1992KM50000095
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GROWTH MECHANISMS AND PROPERTIES OF 90-DEGREES GRAIN-BOUNDARIES IN YBA2CU3O7 THIN-FILMS
PHYSICAL REVIEW B
1992; 46 (18): 11902-11913
View details for Web of Science ID A1992JX92900074
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ALL-REFLECTIVE PHASE-SHIFTING MASKS FOR MARKLE-DYSON OPTICS
36TH ANNUAL INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS
AMER INST PHYSICS. 1992: 3042–46
View details for Web of Science ID A1992KM50000138
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1/8 MU-M OPTICAL LITHOGRAPHY
36TH ANNUAL INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS
AMER INST PHYSICS. 1992: 3032–36
View details for Web of Science ID A1992KM50000136
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SPATIAL CORRELATION OF ELECTRON-BEAM MASK ERRORS AND THE IMPLICATIONS FOR INTEGRATED-CIRCUIT YIELD
36TH ANNUAL INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS
AMER INST PHYSICS. 1992: 2633–37
View details for Web of Science ID A1992KM50000051
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ANALYTIC OPTIMIZATION OF DYSON OPTICS
APPLIED OPTICS
1992; 31 (10): 1444-1449
Abstract
A prototype of a 248-nm optical projection printer based on the unit magnification Dyson configuration was designed and built [J. Vac. Sci. Technol. 9, 3108 (1991)]. Iterative computer methods were used to optimize the geometry of the system to provide minimum aberrations over a given field. Here we present an alternative optimization procedure and use it to design a 193-nm system. This new procedure yields useful insights into the design process and allows us to see why modifications in geometry are required for optimum performance. An understanding of the trade-offs involved in the optimization allows us to suggest and evaluate future design changes.
View details for Web of Science ID A1992HM11000012
View details for PubMedID 20720776
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NANOLITHOGRAPHY AND ITS PROSPECTS AS A MANUFACTURING TECHNOLOGY
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1992; 10 (1): 278-285
View details for Web of Science ID A1992HD56900048
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MARKLE-DYSON OPTICS FOR 0.25-MU-M LITHOGRAPHY AND BEYOND
35TH INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS
AMER INST PHYSICS. 1991: 3108–12
View details for Web of Science ID A1991GW42300074
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QUANTUM LITHOGRAPHY
35TH INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS
AMER INST PHYSICS. 1991: 2986–91
View details for Web of Science ID A1991GW42300049
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SILICON ON QUARTZ REFLECTIVE MASKS FOR 0.25-MU-M MICROLITHOGRAPHY
35TH INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS
AMER INST PHYSICS. 1991: 3138–42
View details for Web of Science ID A1991GW42300080
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AN ELASTIC CROSS-SECTION MODEL FOR USE WITH MONTE-CARLO SIMULATIONS OF LOW-ENERGY ELECTRON-SCATTERING FROM HIGH ATOMIC-NUMBER TARGETS
35TH INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS
AMER INST PHYSICS. 1991: 3578–81
View details for Web of Science ID A1991GW42300168
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ABSENCE OF WEAK-LINK BEHAVIOR IN YBA2CU3O7 GRAINS CONNECTED BY 90-DEGREES [010] TWIST BOUNDARIES
NATURE
1991; 353 (6344): 544-547
View details for Web of Science ID A1991GJ64300061
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NANOELECTRONICS
PROCEEDINGS OF THE IEEE
1991; 79 (8): 1091-1092
View details for Web of Science ID A1991GH43900001
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LATERAL RESONANT TUNNELING TRANSISTORS EMPLOYING FIELD-INDUCED QUANTUM-WELLS AND BARRIERS
PROCEEDINGS OF THE IEEE
1991; 79 (8): 1131-1139
View details for Web of Science ID A1991GH43900005
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LIMITS OF NANO-GATE FABRICATION
PROCEEDINGS OF THE IEEE
1991; 79 (8): 1093-1105
View details for Web of Science ID A1991GH43900002
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MAGNETIC PENETRATION DEPTH MEASUREMENTS OF SUPERCONDUCTING THIN-FILMS BY A MICROSTRIP RESONATOR TECHNIQUE
REVIEW OF SCIENTIFIC INSTRUMENTS
1991; 62 (7): 1801-1812
View details for Web of Science ID A1991FU52200017
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MULTICOMPONENT LANGMUIR-BLODGETT RESISTS FOR OPTICAL LITHOGRAPHY
34TH INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS
AMER INST PHYSICS. 1990: 1441–46
View details for Web of Science ID A1990EP32300045
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PROCESS MARGINS FOR PULSED LASER-INDUCED VIA FILLING
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1990; 8 (6): 1780-1785
View details for Web of Science ID A1990EP32300109
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DISTORTION MEASUREMENT OF EMBEDDED ABSORBER (SILICON MEMBRANE) AND CONVENTIONAL (DIAMOND MEMBRANE) X-RAY MASKS
34TH INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS
AMER INST PHYSICS. 1990: 1584–88
View details for Web of Science ID A1990EP32300071
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VOID FORMATION IN PULSED LASER-INDUCED VIA CONTACT HOLE FILLING
APPLIED PHYSICS LETTERS
1990; 56 (26): 2625-2627
View details for Web of Science ID A1990DL17900010
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RESONANT TUNNELING OF 1-DIMENSIONAL ELECTRONS ACROSS AN ARRAY OF 3-DIMENSIONALLY CONFINED POTENTIAL WELLS
SUPERLATTICES AND MICROSTRUCTURES
1990; 7 (2): 131-134
View details for Web of Science ID A1990DT26500007
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NEW LATERAL RESONANT TUNNELING FETS FABRICATED USING MOLECULAR-BEAM EPITAXY AND ULTRA-HIGH RESOLUTION ELECTRON-BEAM LITHOGRAPHY
INSTITUTE OF PHYSICS CONFERENCE SERIES
1990: 875-879
View details for Web of Science ID A1990DX28100147
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NEW LATERAL RESONANT TUNNELING FETS FABRICATED USING MOLECULAR-BEAM EPITAXY AND ULTRA-HIGH RESOLUTION ELECTRON-BEAM LITHOGRAPHY
16TH INTERNATIONAL SYMP ON GALLIUM ARSENIDE AND RELATED COMPOUNDS
IOP PUBLISHING LTD. 1990: 875–879
View details for Web of Science ID A1990BR54S00147
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ULTRATHIN POLY(METHYLMETHACRYLATE) RESIST FILMS FOR MICROLITHOGRAPHY
33RD INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS ( 33 ISEIPB )
AMER INST PHYSICS. 1989: 1745–50
View details for Web of Science ID A1989CG91400085
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EFFECTS OF CHROMIUM ON THE REACTIVE ION ETCHING OF STEEP-WALLED TRENCHES IN SILICON
33RD INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS ( 33 ISEIPB )
AMER INST PHYSICS. 1989: 1497–1501
View details for Web of Science ID A1989CG91400034
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ENGINEERING LATERAL QUANTUM INTERFERENCE DEVICES USING ELECTRON-BEAM LITHOGRAPHY AND MOLECULAR-BEAM EPITAXY
33RD INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS ( 33 ISEIPB )
AMER INST PHYSICS. 1989: 2015–19
View details for Web of Science ID A1989CG91400142
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EXPOSURE OF ULTRATHIN POLYMER RESISTS WITH THE SCANNING TUNNELING MICROSCOPE
33RD INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS ( 33 ISEIPB )
AMER INST PHYSICS. 1989: 1717–22
View details for Web of Science ID A1989CG91400080
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OBSERVATION OF ELECTRON RESONANT TUNNELING IN A LATERAL DUAL-GATE RESONANT TUNNELING FIELD-EFFECT TRANSISTOR
APPLIED PHYSICS LETTERS
1989; 55 (2): 176-178
View details for Web of Science ID A1989AE16200031
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MODELING OF LASER PLANARIZATION OF THIN METAL-FILMS
APPLIED PHYSICS LETTERS
1989; 54 (12): 1109-1111
View details for Web of Science ID A1989T690700012
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LITHOGRAPHY AND SPECTROSCOPY OF ULTRATHIN LANGMUIR BLODGETT POLYMER-FILMS
ACS SYMPOSIUM SERIES
1989; 412: 349-363
View details for Web of Science ID A1989CG46800021
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FLASHLAMP-PUMPED DYE AND EXCIMER LASER PLANARIZATION OF THIN METAL-FILMS
SYMP AT THE 1988 FALL MEETING OF THE MATERIALS RESEARCH SOC : LASER- BEAM AND PARTICLE-BEAM CHEMICAL PROCESSES ON SURFACES
MATERIALS RESEARCH SOC. 1989: 569–577
View details for Web of Science ID A1989BP83R00079
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PHOTOPHYSICAL STUDIES OF SPIN-CAST POLYMER-FILMS
ACS SYMPOSIUM SERIES
1989; 381: 95-111
View details for Web of Science ID A1989AA05200007
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ULTRATHIN POLYMER-FILMS FOR MICROLITHOGRAPHY
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1988; 6 (6): 2274-2279
View details for Web of Science ID A1988R607100132
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HIGH-RESOLUTION AND HIGH-FIDELITY X-RAY MASK STRUCTURE EMPLOYING EMBEDDED ABSORBERS
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1988; 6 (6): 2202-2206
View details for Web of Science ID A1988R607100118
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APPLICATIONS OF A VARIABLE ENERGY FOCUSED ION-BEAM SYSTEM
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1988; 6 (6): 2115-2119
View details for Web of Science ID A1988R607100099
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NOVEL MONTE-CARLO SIMULATION OF SPACE-CHARGE-INDUCED ENERGY BROADENING IN LASER IRRADIATED CATHODES
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1988; 6 (6): 1989-1994
View details for Web of Science ID A1988R607100071
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OBSERVATION AND MANIPULATION OF POLYMERS BY SCANNING TUNNELLING AND ATOMIC FORCE MICROSCOPY
JOURNAL OF MICROSCOPY-OXFORD
1988; 152: 229-236
View details for Web of Science ID A1988T950600029
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PHYSICAL LIMITS TO THE USEFUL PACKAGING DENSITY OF ELECTRONIC SYSTEMS
IBM JOURNAL OF RESEARCH AND DEVELOPMENT
1988; 32 (5): 636-646
View details for Web of Science ID A1988R194200007
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IMAGING AND MODIFICATION OF POLYMERS BY SCANNING TUNNELING AND ATOMIC FORCE MICROSCOPY
JOURNAL OF APPLIED PHYSICS
1988; 64 (3): 1178-1184
View details for Web of Science ID A1988P389600034
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LATERAL UNIFORMITY OF N+/P JUNCTIONS FORMED BY ARSENIC DIFFUSION FROM EPITAXIALLY ALIGNED POLYCRYSTALLINE SILICON ON SILICON
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
1988; 135 (7): 1773-1779
View details for Web of Science ID A1988P239200036
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LATERAL RESONANT TUNNELING FIELD-EFFECT TRANSISTOR
APPLIED PHYSICS LETTERS
1988; 52 (23): 1982-1984
View details for Web of Science ID A1988N682200018
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A VARIABLE ENERGY FOCUSED ION-BEAM SYSTEM FOR INSITU MICROFABRICATION
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1988; 6 (3): 966-973
View details for Web of Science ID A1988N844300034
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ELECTRON SATURATION VELOCITY VARIATION IN INGAAS AND GAAS CHANNEL MODFETS FOR GATE LENGTHS TO 550-A
IEEE ELECTRON DEVICE LETTERS
1988; 9 (3): 148-150
View details for Web of Science ID A1988M280900014
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CONTENT-ADDRESSABLE MEMORY FOR VLSI PATTERN INSPECTION
IEEE JOURNAL OF SOLID-STATE CIRCUITS
1988; 23 (1): 74-78
View details for Web of Science ID A1988L920300012
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A MULTIPLE EXPOSURE STRATEGY FOR REDUCING BUTTING ERRORS IN A RASTER-SCANNED ELECTRON-BEAM EXPOSURE SYSTEM
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1988; 6 (1): 213-215
View details for Web of Science ID A1988M172300040
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LIFT-OFF METALLIZATION USING POLY(METHYL METHACRYLATE) EXPOSED WITH A SCANNING TUNNELING MICROSCOPE
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1988; 6 (1): 293-296
View details for Web of Science ID A1988M172300059
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SUB-100-NM GATE LENGTH GAAS METAL-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS AND MODULATION-DOPED FIELD-EFFECT TRANSISTORS FABRICATED BY A COMBINATION OF MOLECULAR-BEAM EPITAXY AND ELECTRON-BEAM LITHOGRAPHY
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1988; 6 (1): 328-332
View details for Web of Science ID A1988M172300067
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A LATERAL RESONANT TUNNELING FET
SUPERLATTICES AND MICROSTRUCTURES
1988; 4 (2): 181-186
View details for Web of Science ID A1988N360300011
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SUPERCONDUCTORS AS VERY HIGH-SPEED SYSTEM-LEVEL INTERCONNECTS
IEEE ELECTRON DEVICE LETTERS
1987; 8 (12): 582-585
View details for Web of Science ID A1987K965800009
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MOLECULAR MONOLAYERS AND FILMS
LANGMUIR
1987; 3 (6): 932-950
View details for Web of Science ID A1987L190400014
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CLOSELY PACKED MICROSTRIP LINES AS VERY HIGH-SPEED CHIP-TO-CHIP INTERCONNECTS
IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY
1987; 10 (3): 314-320
View details for Web of Science ID A1987K984900003
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EPITAXIAL ALIGNMENT OF ARSENIC IMPLANTED POLYCRYSTALLINE SILICON FILMS ON (100) SILICON OBTAINED BY RAPID THERMAL ANNEALING
APPLIED PHYSICS LETTERS
1987; 50 (12): 751-753
View details for Web of Science ID A1987G536600017
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SCANNING TUNNELING MICROSCOPE AS A MICROMECHANICAL TOOL
APPLIED PHYSICS LETTERS
1987; 50 (10): 569-570
View details for Web of Science ID A1987G640300007
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THE EFFECT OF REFLECTED AND SECONDARY ELECTRONS ON LITHOGRAPHY WITH THE SCANNING TUNNELING MICROSCOPE
SURFACE SCIENCE
1987; 181 (1-2): 278-284
View details for Web of Science ID A1987G720900033
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HIGH-RESOLUTION PATTERNING SYSTEM WITH A SINGLE BORE OBJECTIVE LENS
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1987; 5 (1): 88-91
View details for Web of Science ID A1987G053900017
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EXPOSURE OF CALCIUM-FLUORIDE RESIST WITH THE SCANNING TUNNELING MICROSCOPE
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1987; 5 (1): 430-433
View details for Web of Science ID A1987G053900095
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A SCANNING TUNNELING MICROSCOPE FOR SURFACE MODIFICATION
JOURNAL DE PHYSIQUE
1986; 47 (C-2): 485-491
View details for Web of Science ID A1986C733600075
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SILVER DIFFUSION IN AG2SE/GESE2 INORGANIC RESIST SYSTEM
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1986; 4 (1): 418-421
View details for Web of Science ID A1986A038500089
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LITHOGRAPHY WITH THE SCANNING TUNNELING MICROSCOPE
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1986; 4 (1): 86-88
View details for Web of Science ID A1986A038500016
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NEW TECHNIQUES FOR MODELING FOCUSED ION-BEAMS
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1986; 4 (1): 154-158
View details for Web of Science ID A1986A038500031
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EXCIMER LASER EXPOSURE OF AG2SE/GESE2 - HIGH CONTRAST EFFECTS
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1985; 3 (1): 319-322
View details for Web of Science ID A1985AAU6000068
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HIGH-RESOLUTION, LOW-VOLTAGE PROBES FROM A FIELD-EMISSION SOURCE CLOSE TO THE TARGET PLANE
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1985; 3 (1): 198-201
View details for Web of Science ID A1985AAU6000042
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DEEP UV EXPOSURE OF AG2SE/GESE2 UTILIZING AN EXCIMER LASER
IEEE ELECTRON DEVICE LETTERS
1984; 5 (1): 24-26
View details for Web of Science ID A1984RZ62300011
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ELECTRON-ELECTRON INTERACTIONS IN FINELY FOCUSED BEAMS OF LOW-ENERGY ELECTRONS
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
1984; 131 (4): 894-896
View details for Web of Science ID A1984SL25600041
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RETARDING-FIELD OPTICS FOR PRACTICAL ELECTRON-BEAM LITHOGRAPHY
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
1984; 471: 25-30
View details for Web of Science ID A1984SY56500004
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FABRICATION ISSUES FOR NEXT-GENERATION CIRCUITS
IEEE SPECTRUM
1983; 20 (11): 102-105
View details for Web of Science ID A1983RN99500052
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DOT MATRIX ELECTRON-BEAM LITHOGRAPHY
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1983; 1 (4): 999-1002
View details for Web of Science ID A1983RV03600017
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TEMPERATURE PROFILES IN SOLID TARGETS IRRADIATED WITH FINELY FOCUSED BEAMS
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1983; 1 (1): 91-99
View details for Web of Science ID A1983QB73300017
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DIRECT MEASUREMENT OF TEMPERATURE PROFILES INDUCED BY FINELY FOCUSED BEAMS
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
1983; 1 (2): 739-742
View details for Web of Science ID A1983QS53100174
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SPACE-CHARGE EFFECTS IN FOCUSED ION-BEAMS
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
1983; 1 (4): 1141-1144
View details for Web of Science ID A1983RV03600052
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LOW-ENERGY ELECTRON-BEAM LITHOGRAPHY
OPTICAL ENGINEERING
1983; 22 (2): 195-198
View details for Web of Science ID A1983QH97300006
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ELECTRON-BEAM EXPOSURE OF GESEX
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
1983; 393: 27-33
View details for Web of Science ID A1983RX24500004
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VLSI LITHOGRAPHY FOR THE 80S
ISSCC DIGEST OF TECHNICAL PAPERS
1982; 25: 222-223
View details for Web of Science ID A1982NY99400090
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LOW-ENERGY ELECTRON-BEAM LITHOGRAPHY
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
1982; 333: 76-82
View details for Web of Science ID A1982PA81000013
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SPECIAL ISSUE ON HIGH-RESOLUTION FABRICATION OF ELECTRON DEVICES - FORWORD
IEEE TRANSACTIONS ON ELECTRON DEVICES
1981; 28 (11): 1267-1267
View details for Web of Science ID A1981MQ64900029
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GENERATION AND APPLICATIONS OF FINELY FOCUSED BEAMS OF LOW-ENERGY ELECTRONS
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY
1981; 19 (4): 1048-1052
View details for Web of Science ID A1981MT46600042
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ELECTRON-BEAM LITHOGRAPHY
CONTEMPORARY PHYSICS
1981; 22 (3): 265-290
View details for Web of Science ID A1981LU58200001
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LATERAL EPITAXIAL RECRYSTALLIZATION OF DEPOSITED SILICON FILMS ON SILICON DIOXIDE
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
1981; 128 (5): 1151-1154
View details for Web of Science ID A1981LP20700040
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HIGH-PERFORMANCE HEAT SINKING FOR VLSI
ELECTRON DEVICE LETTERS
1981; 2 (5): 126-129
View details for Web of Science ID A1981LQ20000007
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SCANNING-ELECTRON-BEAM ANNEALING OF ARSENIC-IMPLANTED SILICON
APPLIED PHYSICS LETTERS
1979; 34 (6): 410-412
View details for Web of Science ID A1979GN88500025