Contact

  • Academic
    mharake@stanford.edu
    University - Student Department: Chemical Engineering Position: Graduate

Additional Info

  • Mail Code: 4300

All Publications

  • Effect of Networking Density on the Patterning Performance of Molecular Layer Deposited Alucone Electron Beam/EUV Resists. ACS applied materials & interfaces Than, L. V., D'Acunto, G., Harake, M., Im, H., Kostko, O., Bent, S. F. 2025

    Abstract

    One of the main barriers to continued device scaling in the era of extreme ultraviolet (EUV) lithography is the need for improved photoresist chemistries to address challenges such as poor EUV sensitivity, inadequate etch resistance, and pattern collapse. Metal-organic photoresists are a promising class of materials that can address many of these challenges, and among them, resists deposited via hybrid molecular layer deposition (MLD) have attracted interest for their unique advantages in thickness control, chemical homogeneity, and compatibility with vacuum processing. However, despite many successful demonstrations of patterning, little is known about how the molecular design of hybrid MLD resists affects their lithographic performance. In this work, we study the effect of the network structure, a common feature among all hybrid MLD resists, via a series of aluminum alkoxide ("alucone") negative tone resists with varying networking density. Their patterning mechanism is investigated via electron beam lithography (EBL)─a common proxy for EUV─and compared to their EUV-induced reactions studied via flood exposure and in situ characterization. We show that the resist with the least networking density demonstrates the best sensitivity and resolution, with the ability to resolve dense line/space gratings as small as 14 nm half pitch via EBL.

    View details for DOI 10.1021/acsami.5c13361

    View details for PubMedID 41002150

  • Enhanced ALD Nucleation on Polymeric Separator for Improved Li-S Batteries. ACS applied materials & interfaces D'Acunto, G., Shuchi, S. B., Zheng, X., Than, L. V., Geierstanger, E. M., Harake, M., Cui, A., Werbrouck, A., Mattinen, M., Cui, Y., Bent, S. F. 2025

    Abstract

    Lithium-sulfur (Li-S) batteries, with their superior energy densities, are emerging as promising successors to conventional lithium-ion batteries. However, their widespread adoption is hindered by challenges such as the shuttle effect of polysulfides, which affects discharge capacity and cycling stability. This study explores the transformative potential of atomic layer deposition (ALD) of Al2O3 on commercial PP/PE/PP separators (Celgard), combined with the use of UV ozone exposure to enhance ALD nucleation on the separator surface, to address these challenges. We demonstrate that ALD Al2O3 not only preserves the separator's inherent morphology but also enhances its chemical interactions toward polysulfide, crucial for optimal battery performance. Moreover, batteries with the modified separator exhibit an enhanced specific capacity, reaching up to ∼1150 mAh/g, and a reduced lithium plating overpotential, indicating improved kinetics. Our findings, based on X-ray photoelectron spectroscopy surface characterization and electrochemical evaluations, underscore the significance of ALD-enhanced separators in elevating Li-S battery efficiency by polysulfide adsorption. The research opens up possibilities for high-performance Li-S batteries, suitable for a broad range of applications.

    View details for DOI 10.1021/acsami.4c09967

    View details for PubMedID 39810397

  • Sequential Use of Orthogonal Self-Assembled Monolayers for Area-Selective Atomic Layer Deposition of Dielectric on Metal ADVANCED MATERIALS INTERFACES Liu, T., Harake, M., Bent, S. F. 2022

    View details for DOI 10.1002/admi.202202134

    View details for Web of Science ID 000897675800001