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  • Dielectric laser acceleration of sub-100 keV electrons with silicon dual-pillar grating structures OPTICS LETTERS Leedle, K. J., Ceballos, A., Deng, H., Solgaard, O., Pease, R. F., Byer, R. L., Harris, J. S. 2015; 40 (18): 4344-4347

    Abstract

    We present the demonstration of high-gradient laser acceleration and deflection of electrons with silicon dual-pillar grating structures using both evanescent inverse Smith-Purcell modes and coupled modes. Our devices accelerate subrelativistic 86.5 and 96.3 keV electrons by 2.05 keV over 5.6 μm distance for accelerating gradients of 370 MeV/m with a 3 nJ mode-locked Ti:sapphire laser. We also show that dual pillars can produce uniform accelerating gradients with a coupled-mode field profile. These results represent a significant step toward making practical dielectric laser accelerators for ultrafast, medical, and high-energy applications.

    View details for DOI 10.1364/OL.40.004344

    View details for Web of Science ID 000361556700040

  • Laser acceleration and deflection of 96.3 keV electrons with a silicon dielectric structure OPTICA Leedle, K. J., Pease, R. F., Byer, R. L., Harris, J. S. 2015; 2 (2): 158-161
  • Heat Transfer in Microchannels-2012 Status and Research Needs JOURNAL OF HEAT TRANSFER-TRANSACTIONS OF THE ASME Kandlikar, S. G., Colin, S., Peles, Y., Garimella, S., Pease, R. F., Brandner, J. J., Tuckerman, D. B. 2013; 135 (9)

    View details for DOI 10.1115/1.4024354

    View details for Web of Science ID 000326169800002

  • Low-Temperature Monolithic Three-Layer 3-D Process for FPGA IEEE ELECTRON DEVICE LETTERS Zhang, Z., Chen, C., Crnogorac, F., Chen, S., Griffin, P. B., Pease, R. F., Plummer, J. D., Wong, S. S. 2013; 34 (8): 1044-1046
  • Thermally controlled alignment for wafer-scale lithography JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS Moon, E. E., Chandorkar, S. A., Sreenivasan, S. V., Pease, R. F. 2013; 12 (3)
  • Single Cell Profiling of Circulating Tumor Cells: Transcriptional Heterogeneity and Diversity from Breast Cancer Cell Lines PLOS ONE Powell, A. A., Talasaz, A. H., Zhang, H., Coram, M. A., Reddy, A., Deng, G., Telli, M. L., Advani, R. H., Carlson, R. W., Mollick, J. A., Sheth, S., Kurian, A. W., Ford, J. M., Stockdale, F. E., Quake, S. R., Pease, R. F., Mindrinos, M. N., Bhanot, G., Dairkee, S. H., Davis, R. W., Jeffrey, S. S. 2012; 7 (5)

    Abstract

    To improve cancer therapy, it is critical to target metastasizing cells. Circulating tumor cells (CTCs) are rare cells found in the blood of patients with solid tumors and may play a key role in cancer dissemination. Uncovering CTC phenotypes offers a potential avenue to inform treatment. However, CTC transcriptional profiling is limited by leukocyte contamination; an approach to surmount this problem is single cell analysis. Here we demonstrate feasibility of performing high dimensional single CTC profiling, providing early insight into CTC heterogeneity and allowing comparisons to breast cancer cell lines widely used for drug discovery.We purified CTCs using the MagSweeper, an immunomagnetic enrichment device that isolates live tumor cells from unfractionated blood. CTCs that met stringent criteria for further analysis were obtained from 70% (14/20) of primary and 70% (21/30) of metastatic breast cancer patients; none were captured from patients with non-epithelial cancer (n = 20) or healthy subjects (n = 25). Microfluidic-based single cell transcriptional profiling of 87 cancer-associated and reference genes showed heterogeneity among individual CTCs, separating them into two major subgroups, based on 31 highly expressed genes. In contrast, single cells from seven breast cancer cell lines were tightly clustered together by sample ID and ER status. CTC profiles were distinct from those of cancer cell lines, questioning the suitability of such lines for drug discovery efforts for late stage cancer therapy.For the first time, we directly measured high dimensional gene expression in individual CTCs without the common practice of pooling such cells. Elevated transcript levels of genes associated with metastasis NPTN, S100A4, S100A9, and with epithelial mesenchymal transition: VIM, TGFß1, ZEB2, FOXC1, CXCR4, were striking compared to cell lines. Our findings demonstrate that profiling CTCs on a cell-by-cell basis is possible and may facilitate the application of 'liquid biopsies' to better model drug discovery.

    View details for DOI 10.1371/journal.pone.0033788

    View details for Web of Science ID 000305335000005

    View details for PubMedID 22586443

  • Cooling Three-Dimensional Integrated Circuits using Power Delivery Networks IEEE International Electron Devices Meeting (IEDM) Wei, H., Wu, T. F., Sekar, D., Cronquist, B., Pease, R. F., Mitra, S. IEEE. 2012
  • Comment on "Ultrahigh secondary electron emission of carbon nanotubes" [Appl. Phys. Lett. 96, 213113, (2010)] APPLIED PHYSICS LETTERS ALAM, M. K., Pease, R. F., Nojeh, A. 2011; 98 (6)

    View details for DOI 10.1063/1.3552975

    View details for Web of Science ID 000287242100068

  • Sub-15 nm Photo-electron Source Using a Nano-aperture Integrated with a Nano-antenna Conference on Lasers and Electro-Optics (CLEO) Cheng, Y., Takashima, Y., Maldonado, J. R., Scipioni, L., Ferranti, D., Pianetta, P. A., Hesselink, L., Pease, R. F. IEEE. 2011
  • Semiconductor crystal islands for three-dimensional integration 54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Crnogorac, F., Wong, S., Pease, R. F. A V S AMER INST PHYSICS. 2010: C6P53-C6P58

    View details for DOI 10.1116/1.3511473

    View details for Web of Science ID 000285015200113

  • On the fabrication of three-dimensional silicon-on-insulator based optical phased array for agile and large angle laser beam steering systems 54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Hosseini, A., Kwong, D., Zhang, Y., Chandorkar, S. A., Crnogorac, F., Carlson, A., Fallah, B., Bank, S., Tutuc, E., Rogers, J., Pease, R. F., Chen, R. T. A V S AMER INST PHYSICS. 2010: C6O1-C6O7

    View details for DOI 10.1116/1.3511508

    View details for Web of Science ID 000285015200091

  • Optical and computed evaluation of keyhole diffractive imaging for lensless x-ray microscopy 54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Dai, B., Zhu, D., Jaroensri, R., Kulalert, K., Pianetta, P., Pease, R. F. A V S AMER INST PHYSICS. 2010: C6Q1-C6Q5

    View details for DOI 10.1116/1.3501340

    View details for Web of Science ID 000285015200118

  • Nondestructive detection of deviation in integrated circuits 54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Baghaei, L., Dai, B., Pianetta, P., Pease, R. F. A V S AMER INST PHYSICS. 2010: C6Q25-C6Q27

    View details for DOI 10.1116/1.3518464

    View details for Web of Science ID 000285015200121

  • Iterative phase recovery using wavelet domain constraints JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B Baghaei, L., Rad, A., Dai, B., Pianetta, P., Miao, J., Pease, R. F. 2009; 27 (6): 3192-3195

    View details for DOI 10.1116/1.3258632

    View details for Web of Science ID 000272803400174

  • Unequally Spaced Waveguide Arrays for Silicon Nanomembrane-Based Efficient Large Angle Optical Beam Steering IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS Hosseini, A., Kwong, D., Zhao, Y., Chen, Y., Crnogorac, F., Pease, R. F., Chen, R. T. 2009; 15 (5): 1439-1446
  • Isolating highly enriched populations of circulating epithelial cells and other rare cells from blood using a magnetic sweeper device PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA Talasaz, A. H., Powell, A. A., Huber, D. E., Berbee, J. G., Roh, K., Yu, W., Xiao, W., Davis, M. M., Pease, R. F., Mindrinos, M. N., Jeffrey, S. S., Davis, R. W. 2009; 106 (10): 3970-3975

    Abstract

    The enumeration of rare circulating epithelial cells (CEpCs) in the peripheral blood of metastatic cancer patients has shown promise for improved cancer prognosis. Moving beyond enumeration, molecular analysis of CEpCs may provide candidate surrogate endpoints to diagnose, treat, and monitor malignancy directly from the blood samples. Thorough molecular analysis of CEpCs requires the development of new sample preparation methods that yield easily accessible and purified CEpCs for downstream biochemical assays. Here, we describe a new immunomagnetic cell separator, the MagSweeper, which gently enriches target cells and eliminates cells that are not bound to magnetic particles. The isolated cells are easily accessible and can be extracted individually based on their physical characteristics to deplete any cells nonspecifically bound to beads. We have shown that our device can process 9 mL of blood per hour and captures >50% of CEpCs as measured in spiking experiments. We have shown that the separation process does not perturb the gene expression of rare cells. To determine the efficiency of our platform in isolating CEpCs from patients, we have isolated CEpCs from all 47 tubes of 9-mL blood samples collected from 17 women with metastatic breast cancer. In contrast, we could not find any circulating epithelial cells in samples from 5 healthy donors. The isolated CEpCs are all stored individually for further molecular analysis.

    View details for DOI 10.1073/pnas.0813188106

    View details for Web of Science ID 000264036900059

    View details for PubMedID 19234122

  • X-ray diffraction microscopy: Reconstruction with partial magnitude and spatial a priori information 52nd International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Rad, L. B., Downes, I., Dai, B., Zhu, D., Scherz, A., Ye, J., Pianetta, P., Pease, R. F. A V S AMER INST PHYSICS. 2008: 2362–66

    View details for DOI 10.1116/1.3002487

    View details for Web of Science ID 000261385600098

  • Pulsed laser techniques for nanographoepitaxy 52nd International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Crnogorac, F., Witte, D. J., Pease, R. F. A V S AMER INST PHYSICS. 2008: 2520–23

    View details for DOI 10.1116/1.3013373

    View details for Web of Science ID 000261385600129

  • Preferential orientation effects in partial melt laser crystallization of silicon 52nd International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Witte, D. J., Masbou, M. P., Crnogorac, F., Pease, R. F., Pickard, D. S. A V S AMER INST PHYSICS. 2008: 2455–59

    View details for DOI 10.1116/1.2998702

    View details for Web of Science ID 000261385600116

  • Prospects of free electron analog to digital technology 52nd International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Aldana, R., Pease, R. F. A V S AMER INST PHYSICS. 2008: 2592–95

    View details for DOI 10.1116/1.2991988

    View details for Web of Science ID 000261385600144

  • Photoemission from single-walled carbon nanotubes JOURNAL OF APPLIED PHYSICS Nojeh, A., Ioakeimidi, K., Sheikhaei, S., Pease, R. F. 2008; 104 (5)

    View details for DOI 10.1063/1.2968457

    View details for Web of Science ID 000259853600114

  • Secondary electron detection for distributed axis electron beam systems MICROELECTRONIC ENGINEERING Tanimoto, S., Pickard, D. S., Kenney, C., Pease, R. F. 2008; 85 (8): 1786-1791
  • Spatial Quantized Analog-to-Digital Conversion Based on Optical Beam-Steering JOURNAL OF LIGHTWAVE TECHNOLOGY Jarrahi, M., Pease, R. F., Lee, T. H. 2008; 26 (13-16): 2219-2226
  • Demonstration of secondary electron detection using monolithic multi-channel electron detector 20th International Microprocesses and Nanotechnology Conference Tanimoto, S., Pickard, D. S., Kenney, C., Hasi, J., Pease, R. F. JAPAN SOC APPLIED PHYSICS. 2008: 4913–17
  • Lithography and other patterning techniques for future electronics PROCEEDINGS OF THE IEEE Pease, R. F., Chou, S. Y. 2008; 96 (2): 248-270
  • Significant advances in scanning electron microscopes (1965-2007) ADVANCES IN IMAGING AND ELECTRON PHYSICS, VOL 150 Pease, R. F. 2008; 150: 53-86
  • Real time simulation of heat detection in DNA Thermosequencing 3rd IEEE Sensors Applications Symposium Esfandyarpour, H., Zheng, B., Pease, R. F., Davis, R. W. IEEE. 2008: 89–94
  • Metal-semiconductor-metal electron detectors 51st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication Aldana, R., Pease, R. F. A V S AMER INST PHYSICS. 2007: 2077–80

    View details for DOI 10.1116/1.2798745

    View details for Web of Science ID 000251611900061

  • CsBr/GaN heterojunction photoelectron source 51st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication Maldonado, J. R., Liu, Z., Sun, Y., Schuetter, S., Pianetta, P., Pease, R. F. A V S AMER INST PHYSICS. 2007: 2266–70

    View details for DOI 10.1116/1.2779042

    View details for Web of Science ID 000251611900100

  • Rapid partial melt crystallization of silicon for monolithic three-dimensional integration 51st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication Witte, D. J., Pickard, D. S., Crnogorac, F., Pianetta, P., Pease, R. F. A V S AMER INST PHYSICS. 2007: 1989–92

    View details for DOI 10.1116/1.2798732

    View details for Web of Science ID 000251611900041

  • Monolithic multichannel secondary electron detector for distributed axis electron beam lithography and inspection 51st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication Pickard, D. S., Kenney, C., Tanimoto, S., Crane, T., Groves, T., Pease, R. F. A V S AMER INST PHYSICS. 2007: 2277–83

    View details for DOI 10.1116/1.2804611

    View details for Web of Science ID 000251611900102

  • Economic approximate models for backscattered electrons 51st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication Rad, L. B., Downes, I., Ye, J., Adler, D., Pease, R. F. A V S AMER INST PHYSICS. 2007: 2425–29

    View details for DOI 10.1116/1.2794068

    View details for Web of Science ID 000251611900132

  • High current density GaN/CsBr heterojunction photocathode with improved photoyield APPLIED PHYSICS LETTERS Liu, Z., Sun, Y., Pianetta, P., Maldonado, J. R., Pease, R. F., Schuetter, S. 2007; 90 (23)

    View details for DOI 10.1063/1.2746959

    View details for Web of Science ID 000247145500015

  • Lamellar crystallization of silicon for 3-dimensional integration 32nd International Conference on Micro- and Nano-Engineering Witte, D. J., Crnogorac, F., Pickard, D. S., Mehta, A., Liu, Z., Rajendran, B., Pianetta, P., Pease, R. F. ELSEVIER SCIENCE BV. 2007: 1186–89
  • Nano-graphoepitaxy of semiconductors for 3D integration 32nd International Conference on Micro- and Nano-Engineering Crnogorac, F., Witte, D. J., Xia, Q., Rajendran, B., Pickard, D. S., Liu, Z., Mehta, A., Sharma, S., Yasseri, A., Kamins, T. I., Chou, S. Y., Pease, R. F. ELSEVIER SCIENCE BV. 2007: 891–94
  • Low thermal budget processing for sequential 3-D IC fabrication IEEE TRANSACTIONS ON ELECTRON DEVICES Rajendran, B., Shenoy, R. S., Witte, D. J., Chokshi, N. S., DeLeon, R. L., Tompa, G. S., Pease, R. F. 2007; 54 (4): 707-714
  • High-speed scanning electron Microscopy using distributed-axis electron optics 20th International Microprocesses and Nanotechnology Conference Pease, R. F., Pickard, D. S., Tanimoto, S. JAPAN SOCIETY APPLIED PHYSICS. 2007: 414–415
  • Computational scanning electron microscopy International Conference on Frontiers of Characterization and Metrology for Nanoelectronics Rad, L. B., Feng, H., Ye, J., Pease, R. F. AMER INST PHYSICS. 2007: 512–517
  • Field-electron emission from single-walled carbon nanotubes lying on a surface 2007 CANADIAN CONFERENCE ON ELECTRICAL AND COMPUTER ENGINEERING, VOLS 1-3 Nojeh, A., Pease, R. F. 2007: 1294-1297
  • Traveling wave spatial quantized analog-to-digital conversion IEEE/MTT-S International Microwave Symposium Jarrahi, M., Pease, R. F., Lee, T. H. IEEE. 2007: 225–228
  • Optical Spatially Quantized High Performance Analog-to-digital Conversion Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference Jarrahi, M., Miller, D. A., Pease, R. F., Lee, T. H. IEEE. 2007: 987–988
  • Effect of nanoimprinted surface relief on Si and Ge nucleation and ordering 6th International Workshop on Epitaxial Semiconductors on Patterned Substrates and Novel Index Surfaces (ESPS-NIS 2006) Kamins, T. I., Yasseri, A. A., Sharma, S., Pease, R. F., Xia, Q., Chou, S. Y. ELSEVIER SCI LTD. 2006: 1481–85
  • Pattern reconstruction of scanning electron microscope images using long-range content complexity analysis of the edge ridge signal 50th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication Feng, H., Ye, J., Pease, R. F. A V S AMER INST PHYSICS. 2006: 3110–14

    View details for DOI 10.1116/1.2363408

    View details for Web of Science ID 000243324400115

  • Alkylsiloxane self-assembled monolayer formation guided by nanoimprinted Si and SiO2 templates APPLIED PHYSICS LETTERS Yasseri, A. A., Sharma, S., Kamins, T. I., Xia, Q., Chou, S. Y., Pease, R. F. 2006; 89 (15)

    View details for DOI 10.1063/1.2360920

    View details for Web of Science ID 000241247900113

  • CsBr photocathode at 257 nm: A rugged high current density electron source APPLIED PHYSICS LETTERS Liu, Z., Maldonado, J., Sun, Y., Pianetta, P., Pease, R. F. 2006; 89 (11)

    View details for DOI 10.1063/1.2354029

    View details for Web of Science ID 000240545400014

  • Shot noise models for sequential processes and the role of lateral mixing 49th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication Neureuther, A. R., Pease, R. F., Yuan, L., Parizi, K. B., Esfandyarpour, H., Poppe, W. J., Liddle, J. A., Anderson, E. H. A V S AMER INST PHYSICS. 2006: 1902–8

    View details for DOI 10.1116/1.2218875

    View details for Web of Science ID 000239890000036

  • Parameters and mechanisms governing image contrast in scanning electron microscopy of single-walled carbon nanotubes SCANNING Wong, W. K., Nojeh, A., Pease, R. F. 2006; 28 (4): 219-227

    Abstract

    Image formation of single-walled carbon nanotubes (SWNTs) in the scanning electron microscope (SEM) is peculiarly sensitive to primary electron landing energy, imaging history, sample/substrate geometry, electrical conductivity, sample contamination, and substrate charging. This sensitivity is probably due to the extremely small interaction volume of the SWNTs' monolayered, nanoscale structures with the electron beam. Traditional electron beam/bulk specimen interaction models appear unable to explain the contrast behavior when directly applied to SWNTs. We present one systematic case study of SWNT SEM imaging with special attention to the above parameters and propose some physical explanations for the effect of each. We also demonstrate that it is possible to employ voltage biasing to counteract this extrinsic behavior, gain better control of the image contrast, and facilitate the interpretation of SWNT images in the SEM.

    View details for Web of Science ID 000239952200004

    View details for PubMedID 16898669

  • Direct, in-scanner, aerial image sensing 31st International Conference on Micro- and Nano-Engineering Pease, R. F. ELSEVIER SCIENCE BV. 2006: 1030–35
  • Ab initio modeling of the interaction of electron beams and single-walled carbon nanotubes PHYSICAL REVIEW LETTERS Nojeh, A., Shan, B., Cho, K., Pease, R. F. 2006; 96 (5)

    Abstract

    Single-walled carbon nanotubes are readily observable in a scanning electron microscope, which traditional models fail to explain. We present an ab initio model to explain how the electron beam can interact with these structures despite the very small, nanoscale, interaction volume. In particular, we show how the electron beam can generate very strong secondary electron emission from the tip of a nanotube under external electric field. The approach may also be used in modeling the interaction of charged particles with nanostructures in other applications such as electron detection.

    View details for DOI 10.1103/PhysRevLett.96.056802

    View details for Web of Science ID 000235252200065

    View details for PubMedID 16486969

  • Segmentation-assisted edge extraction algorithms for SEM images 26th Annual BACUS Symposium on Photomask Technology Feng, H., Ye, J., Pease, R. F. SPIE-INT SOC OPTICAL ENGINEERING. 2006

    View details for DOI 10.1117/12.691464

    View details for Web of Science ID 000243620500050

  • Narrow cone emission from negative electron affinity photocathodes 49th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication Liu, Z., Sun, Y., Pianetta, P., Pease, R. F. A V S AMER INST PHYSICS. 2005: 2758–62

    View details for DOI 10.1116/1.2101726

    View details for Web of Science ID 000234613200092

  • Reconstruction of pattern images from scanning electron microscope images 49th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication Feng, H. Y., Ye, J., Pease, R. F. A V S AMER INST PHYSICS. 2005: 3080–84

    View details for DOI 10.1116/1.2127944

    View details for Web of Science ID 000234613200156

  • Self inspection of integrated circuits pattern defects using support vector machines 49th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication Feng, H. Y., Ye, J., Pease, R. F. A V S AMER INST PHYSICS. 2005: 3085–89

    View details for DOI 10.1116/1.2062434

    View details for Web of Science ID 000234613200157

  • Maskless lithography 30th International Conference on Micro and Nano Engineering Pease, R. F. ELSEVIER SCIENCE BV. 2005: 381–392
  • Distributed-axis electron beam optics for fast inspection 16th Annual Scanning Conference Pease, R. F., Pickard, D. WILEY-BLACKWELL. 2005: 67–67
  • Parameters and mechanisms governing image contrast in the scanning electron microscopy of carbon nanotubes 16th Annual Scanning Conference Wong, W. K., Nojeh, A., Pease, R. F. WILEY-BLACKWELL. 2005: 87–88
  • Photoelectronic analog-to-digital conversion: Sampling and quantizing at 100 Gs/s IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES Ioakeimidi, K., Leheny, R. F., Gradinaru, S., Bolton, P. R., Aldana, R., Ma, K., Clendenin, J. E., Harris, J. S., Pease, R. F. 2005; 53 (1): 336-342
  • Subpicosecond jitter in picosecond electron bunches 48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Ioakeimidi, K., Gradinaru, S., Liu, Z., Machuca, F., Nielsen, J. F., Aldana, R., Bolton, R. P., Clendenin, J., Leheny, R., Pease, R. F. A V S AMER INST PHYSICS. 2005: 196–200
  • Electron beam stimulated field-emission from single-walled carbon nanotubes 48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Nojeh, A., Wong, W. K., Yieh, E., Pease, R. F., DAI, H. J. A V S AMER INST PHYSICS. 2004: 3124–27

    View details for DOI 10.1116/1.1809628

    View details for Web of Science ID 000226439800104

  • Reaching for the bottom: The evolution of EIPBN 48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Smith, H. I., Pease, R. F. A V S AMER INST PHYSICS. 2004: 2882–84

    View details for DOI 10.1116/1.1828088

    View details for Web of Science ID 000226439800055

  • Dynamic self-inspection of integrated circuit pattern defects 48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Feng, H. Y., Ye, J., Pease, R. F. A V S AMER INST PHYSICS. 2004: 3373–77

    View details for DOI 10.1116/1.1824049

    View details for Web of Science ID 000226439800158

  • Electric-field-directed growth of carbon nanotubes in two dimensions 48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Nojeh, A., Ural, A., Pease, R. F., DAI, H. J. A V S AMER INST PHYSICS. 2004: 3421–25

    View details for DOI 10.1116/1.1821578

    View details for Web of Science ID 000226439800168

  • Self-inspection of IC pattern defects 48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Feng, H. Y., Ye, J., Pease, R. F. A V S AMER INST PHYSICS. 2004: 3386–89

    View details for DOI 10.1116/1.1809627

    View details for Web of Science ID 000226439800161

  • Electron scattering study within the depletion region of the GaN(0001) and the GaAs(100) surface APPLIED PHYSICS LETTERS Liu, Z., Machuca, F., Pianetta, P., SPICER, W. E., Pease, R. F. 2004; 85 (9): 1541-1543

    View details for DOI 10.1063/1.1785865

    View details for Web of Science ID 000223555000031

  • Scanning electron microscopy of field-emitting individual single-walled carbon nanotubes APPLIED PHYSICS LETTERS Nojeh, A., Wong, W. K., Baum, A. W., Pease, R. F., Dai, H. 2004; 85 (1): 112-114

    View details for DOI 10.1063/1.1763984

    View details for Web of Science ID 000222360300038

  • Induced thermal stress fields for three-dimensional distortion control of Si wafer topography REVIEW OF SCIENTIFIC INSTRUMENTS Schaper, C. D., Chen, B. D., Pease, R. F. 2004; 75 (6): 1997-2002

    View details for DOI 10.1063/1.1753101

    View details for Web of Science ID 000221793800010

  • Electrical test structures for mapping nanometer-scale pattern placement errors 47th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Wang, F. M., Pease, R. F. A V S AMER INST PHYSICS. 2004: 12–15

    View details for DOI 10.1116/1.1633279

    View details for Web of Science ID 000220573800004

  • Towards higher-resolution scanning electron microscopy ADVANCES IN IMAGING AND ELECTRON PHYSICS, VOL 133 Pease, R. F. 2004; 133: 187-193
  • Distributed axis electron beam technology for maskless lithography and defect inspection 47th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Pickard, D. S., Groves, T. R., Meisburger, W. D., Crane, T., Pease, R. F. A V S AMER INST PHYSICS. 2003: 2834–38

    View details for DOI 10.1116/1.1629291

    View details for Web of Science ID 000188193600101

  • Transient temperature measurements of resist heating using nanothermocouples 47th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Chu, D. C., Wong, W. K., Goodson, K. E., Pease, R. F. A V S AMER INST PHYSICS. 2003: 2985–89

    View details for DOI 10.1116/1.1624255

    View details for Web of Science ID 000188193600133

  • Photoelectronic analog-to-digital conversion using miniature electron optics: Basic design considerations 47th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Pease, R. F., Ioakeimidi, K., Aldana, R., Leheny, R. A V S AMER INST PHYSICS. 2003: 2826–29

    View details for DOI 10.1116/1.1621664

    View details for Web of Science ID 000188193600099

  • Electron beam induced conductivity in poly(methylmethacrylate) and SiO2 thin films 47th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Bai, M., Pease, R. F., Meisburger, D. A V S AMER INST PHYSICS. 2003: 2638–44

    View details for DOI 10.1116/1.1618237

    View details for Web of Science ID 000188193600064

  • Effect of oxygen adsorption on the efficiency of magnesium photocathodes 47th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Yuan, Q., Baum, A. W., Pease, R. F., Pianetta, P. A V S AMER INST PHYSICS. 2003: 2830–33

    View details for DOI 10.1116/1.1624265

    View details for Web of Science ID 000188193600100

  • A carbon nanotube cross structure as a nanoscale quantum device NANO LETTERS Nojeh, A., Lakatos, G. W., Peng, S., Cho, K., Pease, R. F. 2003; 3 (9): 1187-1190

    View details for DOI 10.1021/nl034278b

    View details for Web of Science ID 000185330700003

  • Optimization and characterization of III-V surface cleaning 15th International Vacuum Microelectronics Conference (IVMC) Liu, Z., Sun, Y., Machuca, F., Pianetta, P., SPICER, W. E., Pease, R. F. A V S AMER INST PHYSICS. 2003: 1953–58

    View details for DOI 10.1116/1.1593644

    View details for Web of Science ID 000185080000140

  • Low frequency noise in sub-100 nm MOSFETs 4th International Symposium on Nanostructures and Mesoscopic Systems (NanoMES 2003) Kramer, T. A., Pease, R. F. ELSEVIER SCIENCE BV. 2003: 13–17
  • Oxygen species in Cs/O activated gallium nitride (GaN) negative electron affinity photocathodes 15th International Vacuum Microelectronics Conference (IVMC) Machuca, F., Liu, Z., Sun, Y., Pianetta, P., SPICER, W. E., Pease, R. F. A V S AMER INST PHYSICS. 2003: 1863–69

    View details for DOI 10.1116/1.1589512

    View details for Web of Science ID 000185080000124

  • Transient measurement of resist charging during electron beam exposure 46th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN) Bai, M., Meisburger, W. D., Pease, R. F. A V S AMER INST PHYSICS. 2003: 106–11

    View details for DOI 10.1116/1.1534571

    View details for Web of Science ID 000182603900021

  • Preparation of clean GaAs(100) studied by synchrotron radiation photoemission JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A Liu, Z., Sun, Y., Machuca, F., Pianetta, P., SPICER, W. E., Pease, R. F. 2003; 21 (1): 212-218

    View details for DOI 10.1116/1.1532737

    View details for Web of Science ID 000182598200031

  • Thin film nano thermocouple sensors for applications in laser and electron beam irradiation 12th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS 03) CHU, D. C., Bilir, D. T., Pease, R. F., Goodson, K. E. IEEE. 2003: 1112–1115
  • Role of oxygen in semiconductor negative electron affinity photocathodes 46th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN) Machuca, F., Liu, Z., Sun, Y., Pianetta, P., SPICER, W. E., Pease, R. F. A V S AMER INST PHYSICS. 2002: 2721–25

    View details for DOI 10.1116/1.1521742

    View details for Web of Science ID 000180307300093

  • Distributed axis electron-beam system for lithography and inspection - preliminary experimental results 46th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN) Pickard, D. S., Campbell, C., Crane, T., Cruz-Rivera, L. J., Davenport, A., Meisburger, W. D., Pease, R. F., Groves, T. R. A V S AMER INST PHYSICS. 2002: 2662–65

    View details for DOI 10.1116/1.1520566

    View details for Web of Science ID 000180307300080

  • Correcting for global space charge by positive ion generation 46th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN) Crane, T., Campbell, C., Pickard, D., Han, L. Q., Takahashi, K., Meisburger, W. D., Pease, R. F. A V S AMER INST PHYSICS. 2002: 2709–12

    View details for DOI 10.1116/1.1523398

    View details for Web of Science ID 000180307300090

  • Submicron thermocouple measurements of electron-beam resist heating 46th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN) Chu, D. C., Bilir, D. T., Pease, R. F., Goodson, K. E. A V S AMER INST PHYSICS. 2002: 3044–46

    View details for DOI 10.1116/1.1523023

    View details for Web of Science ID 000180307300159

  • Simple method for cleaning gallium nitride (0001) 49th International Symposium of the American-Vacuum-Society Machuca, F., Liu, Z., Sun, Y., Pianetta, R., SPICER, W. E., Pease, R. F. A V S AMER INST PHYSICS. 2002: 1784–86

    View details for DOI 10.116/1.11503782

    View details for Web of Science ID 000178146700041

  • Semiconductor technology - Imprints offer moore NATURE Pease, R. F. 2002; 417 (6891): 802-803
  • High-throughput mapping of short-range spatial variations using active electrical metrology IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING Xu, O. Y., Berglund, C. N., Pease, R. F. 2002; 15 (1): 108-117
  • Modeling resist heating in mask fabrication using a multilayer Green's function approach. Conference on Metrology, Inspection, and Process Control for Microlithography XVI CHU, D. C., Pease, R. F., Goodson, K. E. SPIE-INT SOC OPTICAL ENGINEERING. 2002: 206–212
  • Thermal conductivity measurements of thin-film resist 45th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication Chu, D. C., Touzelbaev, M., Goodson, K. E., Babin, S., Pease, R. F. A V S AMER INST PHYSICS. 2001: 2874–77
  • Characterization of multicusp-plasma ion source brightness using micron-scale apertures 45th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication Scott, K. L., King, T. J., Leung, K. N., Pease, R. F. A V S AMER INST PHYSICS. 2001: 2602–6
  • Stochastic Coulomb interaction effect in ion-neutralized electron-beam projection optics 45th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication Takahashi, K., Han, L. Q., Pease, R. F., Meisburger, W. D. A V S AMER INST PHYSICS. 2001: 2572–80
  • Simulation of space charge neutralization using ions in electron beam projection optics 26th International Conference on Micro- and Nano-Engineering Takahashi, K., Han, L. Q., Pease, R. F., Meisburger, W. D. ELSEVIER SCIENCE BV. 2001: 231–238
  • High-speed mapping of inter-transistor overlay variations using active electrical metrology Conference on Metrology, Inspection, and Process Control for Microlithography XV Ouyang, X., Berglund, C. N., Pease, R. F. SPIE-INT SOC OPTICAL ENGINEERING. 2001: 506–514
  • Prospect for high brightness III-nitride electron emitter 44th International Conference on Electron Ion and Photon Beam Technology and Nanofabrication (EIPBN) Machuca, F., Sun, Y., Liu, Z., Ioakeimidi, K., Pianetta, P., Pease, R. F. A V S AMER INST PHYSICS. 2000: 3042–46
  • Scaled measurements of global space-charge induced image blur in electron beam projection system 44th International Conference on Electron Ion and Photon Beam Technology and Nanofabrication (EIPBN) Han, L. Q., Pease, R. F., Meisburger, W. D., Winograd, G. I., Takahashi, K. A V S AMER INST PHYSICS. 2000: 2999–3003
  • Prospects for charged particle lithography as a manufacturing technology 25th International Conference on Micro- and Nano-Engineering Pease, R. F., Han, L. Q., Winograd, G. I., Meisburger, W. D., Pickard, D., McCord, M. A. ELSEVIER SCIENCE BV. 2000: 55–60
  • Field size versus column shortness in high throughput electron beam lithography 43rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 99) Han, L., Pease, R. F., Meisburger, W. D., Winograd, G. I., McCord, M. A. A V S AMER INST PHYSICS. 1999: 2830–35
  • Space-charge-induced aberrations 43rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 99) Winograd, G. I., Meisburger, W. D., Pease, R. F. A V S AMER INST PHYSICS. 1999: 2803–7
  • Maskless extreme ultraviolet lithography 43rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 99) Choksi, N., Pickard, D. S., McCord, M., Pease, R. F., Shroff, Y., Chen, Y. J., Oldham, W., Markle, D. A V S AMER INST PHYSICS. 1999: 3047–51
  • High-throughput, high-spatial-frequency measurement of critical dimension variations using memory circuits as electrical test structures 43rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 99) Ouyang, X., Deeter, T. L., Berglund, C. N., McCord, M. A., Pease, R. F. A V S AMER INST PHYSICS. 1999: 2707–13
  • Charging and discharging of electron beam resist films 43rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 99) Bai, M., Pease, R. F., Tanasa, C., McCord, M. A., Pickard, D. S., Meisburger, D. A V S AMER INST PHYSICS. 1999: 2893–96
  • Global space charge effects in high throughput electron beam lithography SPIE Conference on Charged Particle Optics IV Han, L. Q., Meisburger, W. D., Pease, R. F., Winograd, G. I. SPIE-INT SOCIETY OPTICAL ENGINEERING. 1999: 192–214
  • Performance of adaptive alignment method on asymmetric signals 42nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN) Chen, X., Ghazanfarian, A. A., McCord, M. A., Pease, R. F. A V S AMER INST PHYSICS. 1998: 3637–41
  • Performance investigation of Coulomb interaction-limited high through put electron beam lithography based on empirical modeling 42nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN) Han, L. Q., McCord, M. A., Winograd, G. I., Pease, R. F. A V S AMER INST PHYSICS. 1998: 3215–20
  • Multiplexed blanker array for parallel electron beam lithography 42nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN) Winograd, G. I., Han, L., McCord, M. A., Pease, R. F., Krishnamurthi, V. A V S AMER INST PHYSICS. 1998: 3174–76
  • Lifetime and reliability results for a negative electron affinity photocathode in a demountable vacuum system 42nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN) Sen, P., Pickard, D. S., Schneider, J. E., McCord, M. A., Pease, R. F., Baum, A. W., Costello, K. A. A V S AMER INST PHYSICS. 1998: 3380–84
  • Economical sampling algorithm using Fourier analysis for mapping wafer critical dimension variations 42nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN) Xu, O. Y., Berglund, C. N., McCord, M. A., Pease, R. F., Spence, C., Liu, H. Y. A V S AMER INST PHYSICS. 1998: 3655–60
  • Patterned negative electron affinity photocathodes for maskless electron beam lithography 42nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN) Schneider, J. E., Sen, P., Pickard, D. S., Winograd, G. I., McCord, M. A., Pease, R. F., SPICER, W. E., Baum, A. W., Costello, K. A., Davis, G. A. A V S AMER INST PHYSICS. 1998: 3192–96
  • The micromechanical tunneling transistor JOURNAL OF MICROMECHANICS AND MICROENGINEERING McCord, M. A., Dana, A., Pease, R. F. 1998; 8 (3): 209-212
  • Analysis of the performance limitations from Coulomb interaction in maskless parallel electron beam lithography systems Conference on Emerging Lithographic Technologies II Han, L. Q., McCord, M. A., Winograd, G. I., Pease, R. F. SPIE - INT SOC OPTICAL ENGINEERING. 1998: 292–301
  • Application of the Brewster angle illumination technique to eliminate resist-induced alignment errors Optical Microlithography XI Conference Chen, X., Ghazanfarian, A. A., McCord, M. A., Pease, R. F. SPIE - INT SOC OPTICAL ENGINEERING. 1998: 951–957
  • Resist charging in electron-beam lithography 18th Annual BACUS Symposium on Photomask Technology and Management Bai, M., Picard, D., Tanasa, C., McCord, M. A., Berglund, C. N., Pease, R. F. SPIE - INT SOC OPTICAL ENGINEERING. 1998: 383–388
  • Exploiting structure in positioning of non-symmetric signals IEEE International Conference on Acoustics, Speech and Signal Processing (ICASSP 98) Ghazanfarian, A. A., Chen, X., KAILATH, T., McCord, M. A., Pease, R. F. IEEE. 1998: 1913–1916
  • High accuracy alignment based on subspace decomposition Optical Microlithography XI Conference Ghazanfarian, A. A., Chen, X., McCord, M. A., Pease, R. F. SPIE - INT SOC OPTICAL ENGINEERING. 1998: 502–509
  • Obtaining a physical two-dimensional Cartesian reference 41st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN) Takac, M. T., Ye, J., Raugh, M. R., Pease, R. F., Berglund, C. N., Owen, G. A V S AMER INST PHYSICS. 1997: 2173–76
  • Minimum emission current of liquid metal ion sources 41st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN) Beckman, J. C., Chang, T. H., Wagner, A., Pease, R. F. A V S AMER INST PHYSICS. 1997: 2332–36
  • Practical approach to separating the pattern generator-induced mask CD errors from the blank/process-induce mask CD errors using conventional market measurements 41st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN) Han, L. Q., Wang, W. D., McCord, M. A., Berglund, C. N., Pease, R. F., Weaver, L. S. A V S AMER INST PHYSICS. 1997: 2243–48
  • Blanked aperture array for parallel electron beam lithography 41st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN) Winograd, G. I., Pease, R. F., McCord, M. A. A V S AMER INST PHYSICS. 1997: 2289–92
  • Accurate alignment on asymmetrical signals 41st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN) Chen, X., Ghazanfarian, A. A., McCord, M., Pease, R. F. A V S AMER INST PHYSICS. 1997: 2185–88
  • Novel objective lens for low voltage electron beam imaging 41st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN) Liu, W., McCord, M., Pease, R. F. A V S AMER INST PHYSICS. 1997: 2737–41
  • Neural network model for global alignment incorporating wafer and stage distortion 41st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN) Ghazanfarian, A. A., Pease, R. F., Chen, X., McCord, M. A. A V S AMER INST PHYSICS. 1997: 2146–50
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  • Optimal coherent decompositions for radially symmetric optical systems 41st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIBPN) von Bunau, R. M., Pati, Y. C., Wang, Y. T., Pease, R. F. A V S AMER INST PHYSICS. 1997: 2412–16
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  • Fabrication of silicon nanopillars containing polycrystalline silicon/insulator multilayer structures APPLIED PHYSICS LETTERS Fukuda, H., Hoyt, J. L., McCord, M. A., Pease, R. F. 1997; 70 (3): 333-335
  • An exact algorithm for self-calibration of two-dimensional precision metrology stages PRECISION ENGINEERING-JOURNAL OF THE AMERICAN SOCIETY FOR PRECISION ENGINEERING Ye, J., Takac, M., Berglund, C. N., Owen, G., Pease, R. F. 1997; 20 (1): 16-32
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  • Patterned media: A viable route to 50 Gbit/in(2) and up for magnetic recording? 7th Annual Magnetic Recording Conference (TMRC) on Media White, R. L., New, R. M., Pease, R. F. IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC. 1997: 990–95
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  • Structure in thin and ultrathin spin-cast polymer films SCIENCE Frank, C. W., Rao, V., DESPOTOPOULOU, M. M., Pease, R. F., Hinsberg, W. D., Miller, R. D., Rabolt, J. F. 1996; 273 (5277): 912-915
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  • Lithographically patterned single-domain cobalt islands for high-density magnetic recording 6th International Conference on Magnetic Recording Media New, R. M., Pease, R. F., White, R. L. ELSEVIER SCIENCE BV. 1996: 140–45
  • Self-calibration in two-dimensions: The experiment 10th Annual SPIE Conference on Metrology, Inspection, and Process Control for Microlithography Takac, M. T., Ye, J., Raugh, M. R., Pease, R. F., Berglund, C. N., Owen, G. SPIE - INT SOC OPTICAL ENGINEERING. 1996: 130–146
  • Can nanolithography ever be a manufacturing technology? 1st International Conference on Low Dimensional Structures and Devices Pease, R. F. ELSEVIER SCIENCE SA. 1995: 188–91
  • EFFECT OF MAGNETOCRYSTALLINE ANISOTROPY IN SINGLE-DOMAIN POLYCRYSTALLINE COBALT ISLANDS 1995 IEEE International Magnetics Conference (INTERMAG 95) New, R. M., Pease, R. F., White, R. L. IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC. 1995: 3805–7
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  • IMPROVED RETARDING-FIELD OPTICS VIA IMAGE OUTSIDE FIELD JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B HORDON, L. S., Boyer, B. B., Pease, R. F. 1995; 13 (3): 826-832
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  • High-performance negative electron affinity photocathodes for high resolution electron beam lithography and metrology 1995 International Electron Devices Meeting Baum, A. W., Schneider, J. E., Pease, R. F. IEEE. 1995: 409–412
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  • THE EFFECT OF GAPS IN MARKLE-DYSON OPTICS FOR SUB-QUARTER-MICRON LITHOGRAPHY 6th (5th International) MicroProcess Conference (MPC 93) Owen, G., Grenville, A., VONBUNAU, R., Jeong, H., Markle, D. A., Pease, R. F. JAPAN SOC APPLIED PHYSICS. 1993: 5840–44
  • SELF-LIMITING OXIDATION OF SI NANOWIRES 37th International Symposium on Electron, Ion, and Photon Beams Liu, H. I., BIEGELSEN, D. K., Johnson, N. M., Ponce, F. A., Pease, R. F. A V S AMER INST PHYSICS. 1993: 2532–37
  • IMAGE MONITOR FOR MARKLE-DYSON OPTICS 37th International Symposium on Electron, Ion, and Photon Beams Grenville, A., Owen, G., Pease, R. F. A V S AMER INST PHYSICS. 1993: 2700–2704
  • OPTICAL PROJECTION SYSTEM FOR GIGABIT DYNAMIC RANDOM-ACCESS MEMORIES 37th International Symposium on Electron, Ion, and Photon Beams Jeong, H., Markle, D. A., Owen, G., Pease, R. F., Grenville, A. A V S AMER INST PHYSICS. 1993: 2675–79
  • HIGH-ASPECT-RATIO LINES AS LOW DISTORTION, HIGH-FREQUENCY OFF-CHIP INTERCONNECTS IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY BLENNEMANN, H. C., Pease, R. F. 1993; 16 (7): 692-698
  • LIMITS OF HIGH-DENSITY, LOW-FORCE PRESSURE CONTACTS 15th IEEE/CHMT International Electronics Manufacturing Technology (IEMT) Symposium: Electronics Manufacturing for the year 2000 Beale, J., Pease, R. F. I E E E. 1993: 136–140
  • LIMITS OF ULTRAVIOLET LITHOGRAPHY OSA Topical Meeting on Soft X-Ray Projection Lithography Pease, R. F. OPTICAL SOC AMERICA. 1993: 6–9
  • REPAIR OF PHASE-SHIFT MASKS USING LOW-ENERGY FOCUSED ION-BEAMS 5TH ( 4TH INTERNATIONAL ) MICROPROCESS CONF ( MPC 92 ) Lee, H. W., Pease, R. F. JAPAN J APPLIED PHYSICS. 1992: 4474–78
  • EFFECT ON SCALING OF HEAT REMOVAL REQUIREMENTS IN 3-DIMENSIONAL SYSTEMS INTERNATIONAL JOURNAL OF ELECTRONICS Ozaktas, H. M., Oksuzoglu, H., Pease, R. F., Goodman, J. W. 1992; 73 (6): 1227-1232
  • PRESENT AND FUTURE-TRENDS IN MICROLITHOGRAPHY 5TH ( 4TH INTERNATIONAL ) MICROPROCESS CONF ( MPC 92 ) Pease, R. F. JAPAN J APPLIED PHYSICS. 1992: 4103–9
  • GROWTH MECHANISMS AND PROPERTIES OF 90-DEGREES GRAIN-BOUNDARIES IN YBA2CU3O7 THIN-FILMS PHYSICAL REVIEW B Eom, C. B., Marshall, A. F., Suzuki, Y., Geballe, T. H., Boyer, B., Pease, R. F., VANDOVER, R. B., Phillips, J. M. 1992; 46 (18): 11902-11913
  • DEPTH OF FOCUS ENHANCEMENT IN OPTICAL LITHOGRAPHY 36TH ANNUAL INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS VONBUNAU, R., Owen, G., Pease, R. F. AMER INST PHYSICS. 1992: 3047–54
  • OXIDATION OF SUB-50 NM SI COLUMNS FOR LIGHT-EMISSION STUDY 36TH ANNUAL INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS Liu, H. I., Maluf, N. I., Pease, R. F., BIEGELSEN, D. K., Johnson, N. M., Ponce, F. A. AMER INST PHYSICS. 1992: 2846–50
  • SPATIAL CORRELATION OF ELECTRON-BEAM MASK ERRORS AND THE IMPLICATIONS FOR INTEGRATED-CIRCUIT YIELD 36TH ANNUAL INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS Berglund, C. N., Maluf, N. I., Ye, J., Owen, G., Browning, R., Pease, R. F. AMER INST PHYSICS. 1992: 2633–37
  • ALL-REFLECTIVE PHASE-SHIFTING MASKS FOR MARKLE-DYSON OPTICS 36TH ANNUAL INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS Hsieh, R. L., Grenville, A., Owen, G., Pease, R. F. AMER INST PHYSICS. 1992: 3042–46
  • 1/8 MU-M OPTICAL LITHOGRAPHY 36TH ANNUAL INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS Owen, G., Pease, R. F., Markle, D. A., Grenville, A., Hsieh, R. L., VONBUNAU, R., Maluf, N. I. AMER INST PHYSICS. 1992: 3032–36
  • LOW-VOLTAGE ALTERNATIVE FOR ELECTRON-BEAM LITHOGRAPHY 36TH ANNUAL INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS Lee, Y. H., Browning, R., Maluf, N., Owen, G., Pease, R. F. AMER INST PHYSICS. 1992: 3094–98
  • ANALYTIC OPTIMIZATION OF DYSON OPTICS APPLIED OPTICS New, R. M., Owen, G., Pease, R. F. 1992; 31 (10): 1444-1449

    Abstract

    A prototype of a 248-nm optical projection printer based on the unit magnification Dyson configuration was designed and built [J. Vac. Sci. Technol. 9, 3108 (1991)]. Iterative computer methods were used to optimize the geometry of the system to provide minimum aberrations over a given field. Here we present an alternative optimization procedure and use it to design a 193-nm system. This new procedure yields useful insights into the design process and allows us to see why modifications in geometry are required for optimum performance. An understanding of the trade-offs involved in the optimization allows us to suggest and evaluate future design changes.

    View details for Web of Science ID A1992HM11000012

    View details for PubMedID 20720776

  • NANOLITHOGRAPHY AND ITS PROSPECTS AS A MANUFACTURING TECHNOLOGY JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B Pease, R. F. 1992; 10 (1): 278-285
  • MARKLE-DYSON OPTICS FOR 0.25-MU-M LITHOGRAPHY AND BEYOND 35TH INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS Grenville, A., Hsieh, R. L., VONBUNAU, R., Lee, Y. H., Markle, D. A., Owen, G., Pease, R. F. AMER INST PHYSICS. 1991: 3108–12
  • QUANTUM LITHOGRAPHY 35TH INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS Maluf, N. I., Pease, R. F. AMER INST PHYSICS. 1991: 2986–91
  • SILICON ON QUARTZ REFLECTIVE MASKS FOR 0.25-MU-M MICROLITHOGRAPHY 35TH INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS Lee, Y. H., Hsieh, R. L., Grenville, A., VONBUNAU, R., Tsai, C. C., Markle, D. A., Owen, G., Browning, R., Pease, R. F. AMER INST PHYSICS. 1991: 3138–42
  • AN ELASTIC CROSS-SECTION MODEL FOR USE WITH MONTE-CARLO SIMULATIONS OF LOW-ENERGY ELECTRON-SCATTERING FROM HIGH ATOMIC-NUMBER TARGETS 35TH INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS Browning, R., Eimori, T., TRAUT, E. P., Chui, B., Pease, R. F. AMER INST PHYSICS. 1991: 3578–81
  • ABSENCE OF WEAK-LINK BEHAVIOR IN YBA2CU3O7 GRAINS CONNECTED BY 90-DEGREES [010] TWIST BOUNDARIES NATURE Eom, C. B., Marshall, A. F., Suzuki, Y., Boyer, B., Pease, R. F., Geballe, T. H. 1991; 353 (6344): 544-547
  • LIMITS OF NANO-GATE FABRICATION PROCEEDINGS OF THE IEEE Allee, D. R., Broers, A. N., Pease, R. F. 1991; 79 (8): 1093-1105
  • NANOELECTRONICS PROCEEDINGS OF THE IEEE Pease, R. F. 1991; 79 (8): 1091-1092
  • LATERAL RESONANT TUNNELING TRANSISTORS EMPLOYING FIELD-INDUCED QUANTUM-WELLS AND BARRIERS PROCEEDINGS OF THE IEEE Chou, S. Y., Allee, D. R., Pease, R. F., Harris, J. S. 1991; 79 (8): 1131-1139
  • MAGNETIC PENETRATION DEPTH MEASUREMENTS OF SUPERCONDUCTING THIN-FILMS BY A MICROSTRIP RESONATOR TECHNIQUE REVIEW OF SCIENTIFIC INSTRUMENTS LANGLEY, B. W., Anlage, S. M., Pease, R. F., Beasley, M. R. 1991; 62 (7): 1801-1812
  • MULTICOMPONENT LANGMUIR-BLODGETT RESISTS FOR OPTICAL LITHOGRAPHY 34TH INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS Kosbar, L. L., Frank, C. W., Pease, R. F. AMER INST PHYSICS. 1990: 1441–46
  • PROCESS MARGINS FOR PULSED LASER-INDUCED VIA FILLING JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B MARELLA, P. F., TUCKERMAN, D. B., Pease, R. F. 1990; 8 (6): 1780-1785
  • DISTORTION MEASUREMENT OF EMBEDDED ABSORBER (SILICON MEMBRANE) AND CONVENTIONAL (DIAMOND MEMBRANE) X-RAY MASKS 34TH INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS Maluf, N. I., Pease, R. F., Windischmann, H. AMER INST PHYSICS. 1990: 1584–88
  • VOID FORMATION IN PULSED LASER-INDUCED VIA CONTACT HOLE FILLING APPLIED PHYSICS LETTERS MARELLA, P. F., TUCKERMAN, D. B., Pease, R. F. 1990; 56 (26): 2625-2627
  • RESONANT TUNNELING OF 1-DIMENSIONAL ELECTRONS ACROSS AN ARRAY OF 3-DIMENSIONALLY CONFINED POTENTIAL WELLS SUPERLATTICES AND MICROSTRUCTURES Allee, D. R., Chou, S. Y., Harris, J. S., Pease, R. F. 1990; 7 (2): 131-134
  • NEW LATERAL RESONANT TUNNELING FETS FABRICATED USING MOLECULAR-BEAM EPITAXY AND ULTRA-HIGH RESOLUTION ELECTRON-BEAM LITHOGRAPHY INSTITUTE OF PHYSICS CONFERENCE SERIES Chou, S. Y., Allee, D. R., Pease, R. F., Harris, J. S. 1990: 875-879
  • NEW LATERAL RESONANT TUNNELING FETS FABRICATED USING MOLECULAR-BEAM EPITAXY AND ULTRA-HIGH RESOLUTION ELECTRON-BEAM LITHOGRAPHY 16TH INTERNATIONAL SYMP ON GALLIUM ARSENIDE AND RELATED COMPOUNDS Chou, S. Y., Allee, D. R., Pease, R. F., Harris, J. S. IOP PUBLISHING LTD. 1990: 875–879
  • EXPOSURE OF ULTRATHIN POLYMER RESISTS WITH THE SCANNING TUNNELING MICROSCOPE 33RD INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS ( 33 ISEIPB ) Zhang, H., HORDON, L. S., KUAN, S. W., MACCAGNO, P., Pease, R. F. AMER INST PHYSICS. 1989: 1717–22
  • EFFECTS OF CHROMIUM ON THE REACTIVE ION ETCHING OF STEEP-WALLED TRENCHES IN SILICON 33RD INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS ( 33 ISEIPB ) Maluf, N. I., Chou, S. Y., McVittie, J. P., KUAN, S. W., Allee, D. R., Pease, R. F. AMER INST PHYSICS. 1989: 1497–1501
  • ENGINEERING LATERAL QUANTUM INTERFERENCE DEVICES USING ELECTRON-BEAM LITHOGRAPHY AND MOLECULAR-BEAM EPITAXY 33RD INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS ( 33 ISEIPB ) Allee, D. R., Chou, S. Y., Harris, J. S., Pease, R. F. AMER INST PHYSICS. 1989: 2015–19
  • ULTRATHIN POLY(METHYLMETHACRYLATE) RESIST FILMS FOR MICROLITHOGRAPHY 33RD INTERNATIONAL SYMP ON ELECTRON, ION, AND PHOTON BEAMS ( 33 ISEIPB ) KUAN, S. W., Frank, C. W., LEE, Y. H., Eimori, T., Allee, D. R., Pease, R. F., Browning, R. AMER INST PHYSICS. 1989: 1745–50
  • OBSERVATION OF ELECTRON RESONANT TUNNELING IN A LATERAL DUAL-GATE RESONANT TUNNELING FIELD-EFFECT TRANSISTOR APPLIED PHYSICS LETTERS Chou, S. Y., Allee, D. R., Pease, R. F., Harris, J. S. 1989; 55 (2): 176-178
  • MODELING OF LASER PLANARIZATION OF THIN METAL-FILMS APPLIED PHYSICS LETTERS MARELLA, P. F., TUCKERMAN, D. B., Pease, R. F. 1989; 54 (12): 1109-1111
  • LITHOGRAPHY AND SPECTROSCOPY OF ULTRATHIN LANGMUIR BLODGETT POLYMER-FILMS ACS SYMPOSIUM SERIES KUAN, S. W., Martin, P. S., Kosbar, L. L., Frank, C. W., Pease, R. F. 1989; 412: 349-363
  • FLASHLAMP-PUMPED DYE AND EXCIMER LASER PLANARIZATION OF THIN METAL-FILMS SYMP AT THE 1988 FALL MEETING OF THE MATERIALS RESEARCH SOC : LASER- BEAM AND PARTICLE-BEAM CHEMICAL PROCESSES ON SURFACES MARELLA, P. F., TUCKERMAN, D. B., Pease, R. F. MATERIALS RESEARCH SOC. 1989: 569–577
  • PHOTOPHYSICAL STUDIES OF SPIN-CAST POLYMER-FILMS ACS SYMPOSIUM SERIES Kosbar, L. L., KUAN, S. W., Frank, C. W., Pease, R. F. 1989; 381: 95-111
  • HIGH-RESOLUTION AND HIGH-FIDELITY X-RAY MASK STRUCTURE EMPLOYING EMBEDDED ABSORBERS JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B Chou, S. Y., Maluf, N. I., Pease, R. F. 1988; 6 (6): 2202-2206
  • APPLICATIONS OF A VARIABLE ENERGY FOCUSED ION-BEAM SYSTEM JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B NARUM, D. H., Pease, R. F. 1988; 6 (6): 2115-2119
  • NOVEL MONTE-CARLO SIMULATION OF SPACE-CHARGE-INDUCED ENERGY BROADENING IN LASER IRRADIATED CATHODES JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B Allee, D. R., Pehoushek, J. D., Pease, R. F. 1988; 6 (6): 1989-1994
  • ULTRATHIN POLYMER-FILMS FOR MICROLITHOGRAPHY JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B KUAN, S. W., Frank, C. W., Fu, C. C., Allee, D. R., MACCAGNO, P., Pease, R. F. 1988; 6 (6): 2274-2279
  • OBSERVATION AND MANIPULATION OF POLYMERS BY SCANNING TUNNELLING AND ATOMIC FORCE MICROSCOPY JOURNAL OF MICROSCOPY-OXFORD DOVEK, M. M., Albrecht, T. R., KUAN, S. W., Lang, C. A., EMCH, R., Grutter, P., Frank, C. W., Pease, R. F., Quate, C. F. 1988; 152: 229-236
  • PHYSICAL LIMITS TO THE USEFUL PACKAGING DENSITY OF ELECTRONIC SYSTEMS IBM JOURNAL OF RESEARCH AND DEVELOPMENT Pease, R. F., Kwon, O. K. 1988; 32 (5): 636-646
  • IMAGING AND MODIFICATION OF POLYMERS BY SCANNING TUNNELING AND ATOMIC FORCE MICROSCOPY JOURNAL OF APPLIED PHYSICS Albrecht, T. R., DOVEK, M. M., Lang, C. A., Grutter, P., Quate, C. F., KUAN, S. W., Frank, C. W., Pease, R. F. 1988; 64 (3): 1178-1184
  • LATERAL UNIFORMITY OF N+/P JUNCTIONS FORMED BY ARSENIC DIFFUSION FROM EPITAXIALLY ALIGNED POLYCRYSTALLINE SILICON ON SILICON JOURNAL OF THE ELECTROCHEMICAL SOCIETY Hoyt, J. L., CRABBE, E. F., Pease, R. F., Gibbons, J. F., Marshall, A. F. 1988; 135 (7): 1773-1779
  • LATERAL RESONANT TUNNELING FIELD-EFFECT TRANSISTOR APPLIED PHYSICS LETTERS Chou, S. Y., Harris, J. S., Pease, R. F. 1988; 52 (23): 1982-1984
  • A VARIABLE ENERGY FOCUSED ION-BEAM SYSTEM FOR INSITU MICROFABRICATION JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B NARUM, D. H., Pease, R. F. 1988; 6 (3): 966-973
  • ELECTRON SATURATION VELOCITY VARIATION IN INGAAS AND GAAS CHANNEL MODFETS FOR GATE LENGTHS TO 550-A IEEE ELECTRON DEVICE LETTERS DELAHOUSSAYE, P. R., Allee, D. R., Pao, Y. C., Schlom, D. G., Harris, J. S., Pease, R. F. 1988; 9 (3): 148-150
  • CONTENT-ADDRESSABLE MEMORY FOR VLSI PATTERN INSPECTION IEEE JOURNAL OF SOLID-STATE CIRCUITS Chae, S. I., Walker, J. T., Fu, C. C., Pease, R. F. 1988; 23 (1): 74-78
  • A LATERAL RESONANT TUNNELING FET SUPERLATTICES AND MICROSTRUCTURES Chou, S. Y., Wolak, E., Harris, J. S., Pease, R. F. 1988; 4 (2): 181-186
  • SUB-100-NM GATE LENGTH GAAS METAL-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS AND MODULATION-DOPED FIELD-EFFECT TRANSISTORS FABRICATED BY A COMBINATION OF MOLECULAR-BEAM EPITAXY AND ELECTRON-BEAM LITHOGRAPHY JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B Allee, D. R., DELAHOUSSAYE, P. R., Schlom, D. G., Harris, J. S., Pease, R. F. 1988; 6 (1): 328-332
  • LIFT-OFF METALLIZATION USING POLY(METHYL METHACRYLATE) EXPOSED WITH A SCANNING TUNNELING MICROSCOPE JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B McCord, M. A., Pease, R. F. 1988; 6 (1): 293-296
  • A MULTIPLE EXPOSURE STRATEGY FOR REDUCING BUTTING ERRORS IN A RASTER-SCANNED ELECTRON-BEAM EXPOSURE SYSTEM JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B DAMERON, D. H., Fu, C. C., Pease, R. F. 1988; 6 (1): 213-215
  • SUPERCONDUCTORS AS VERY HIGH-SPEED SYSTEM-LEVEL INTERCONNECTS IEEE ELECTRON DEVICE LETTERS Kwon, O. K., LANGLEY, B. W., Pease, R. F., Beasley, M. R. 1987; 8 (12): 582-585
  • MOLECULAR MONOLAYERS AND FILMS LANGMUIR Swalen, J. D., Allara, D. L., ANDRADE, J. D., Chandross, E. A., Garoff, S., Israelachvili, J., MCCARTHY, T. J., Murray, R., Pease, R. F., Rabolt, J. F., Wynne, K. J., Yu, H. 1987; 3 (6): 932-950
  • CLOSELY PACKED MICROSTRIP LINES AS VERY HIGH-SPEED CHIP-TO-CHIP INTERCONNECTS IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY Kwon, O. K., Pease, R. F. 1987; 10 (3): 314-320
  • EPITAXIAL ALIGNMENT OF ARSENIC IMPLANTED POLYCRYSTALLINE SILICON FILMS ON (100) SILICON OBTAINED BY RAPID THERMAL ANNEALING APPLIED PHYSICS LETTERS Hoyt, J. L., Crabbe, E., Gibbons, J. F., Pease, R. F. 1987; 50 (12): 751-753
  • SCANNING TUNNELING MICROSCOPE AS A MICROMECHANICAL TOOL APPLIED PHYSICS LETTERS McCord, M. A., Pease, R. F. 1987; 50 (10): 569-570
  • THE EFFECT OF REFLECTED AND SECONDARY ELECTRONS ON LITHOGRAPHY WITH THE SCANNING TUNNELING MICROSCOPE SURFACE SCIENCE McCord, M. A., Pease, R. F. 1987; 181 (1-2): 278-284
  • EXPOSURE OF CALCIUM-FLUORIDE RESIST WITH THE SCANNING TUNNELING MICROSCOPE JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B McCord, M. A., Pease, R. F. 1987; 5 (1): 430-433
  • HIGH-RESOLUTION PATTERNING SYSTEM WITH A SINGLE BORE OBJECTIVE LENS JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B Newman, T. H., Williams, K. E., Pease, R. F. 1987; 5 (1): 88-91
  • A SCANNING TUNNELING MICROSCOPE FOR SURFACE MODIFICATION JOURNAL DE PHYSIQUE McCord, M. A., Pease, R. F. 1986; 47 (C-2): 485-491
  • SILVER DIFFUSION IN AG2SE/GESE2 INORGANIC RESIST SYSTEM JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B POLASKO, K. J., Tsai, C. C., CAGAN, M. R., Pease, R. F. 1986; 4 (1): 418-421
  • LITHOGRAPHY WITH THE SCANNING TUNNELING MICROSCOPE JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B McCord, M. A., Pease, R. F. 1986; 4 (1): 86-88
  • NEW TECHNIQUES FOR MODELING FOCUSED ION-BEAMS JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B NARUM, D. H., Pease, R. F. 1986; 4 (1): 154-158
  • EXCIMER LASER EXPOSURE OF AG2SE/GESE2 - HIGH CONTRAST EFFECTS JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B POLASKO, K. J., Pease, R. F., Marinero, E. E., CAGAN, M. R. 1985; 3 (1): 319-322
  • HIGH-RESOLUTION, LOW-VOLTAGE PROBES FROM A FIELD-EMISSION SOURCE CLOSE TO THE TARGET PLANE JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B McCord, M. A., Pease, R. F. 1985; 3 (1): 198-201
  • DEEP UV EXPOSURE OF AG2SE/GESE2 UTILIZING AN EXCIMER LASER IEEE ELECTRON DEVICE LETTERS POLASKO, K. J., Ehrlich, D. J., Tsao, J. Y., Pease, R. F., Marinero, E. E. 1984; 5 (1): 24-26
  • ELECTRON-ELECTRON INTERACTIONS IN FINELY FOCUSED BEAMS OF LOW-ENERGY ELECTRONS JOURNAL OF THE ELECTROCHEMICAL SOCIETY YAU, Y. W., Pease, R. F., Groves, T. R. 1984; 131 (4): 894-896
  • RETARDING-FIELD OPTICS FOR PRACTICAL ELECTRON-BEAM LITHOGRAPHY PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS Newman, T. H., Pease, R. F. 1984; 471: 25-30
  • LOW-ENERGY ELECTRON-BEAM LITHOGRAPHY OPTICAL ENGINEERING POLASKO, K. J., YAU, Y. W., Pease, R. F. 1983; 22 (2): 195-198
  • DOT MATRIX ELECTRON-BEAM LITHOGRAPHY JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B Newman, T. H., Pease, R. F., DeVore, W. 1983; 1 (4): 999-1002
  • ELECTRON-BEAM EXPOSURE OF GESEX PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS POLASKO, K. J., Pease, R. F. 1983; 393: 27-33
  • TEMPERATURE PROFILES IN SOLID TARGETS IRRADIATED WITH FINELY FOCUSED BEAMS JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B IRANMANESH, A. A., Pease, R. F. 1983; 1 (1): 91-99
  • DIRECT MEASUREMENT OF TEMPERATURE PROFILES INDUCED BY FINELY FOCUSED BEAMS JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A IRANMANESH, A. A., Pease, R. F. 1983; 1 (2): 739-742
  • FABRICATION ISSUES FOR NEXT-GENERATION CIRCUITS IEEE SPECTRUM Pease, R. F. 1983; 20 (11): 102-105
  • SPACE-CHARGE EFFECTS IN FOCUSED ION-BEAMS JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B YAU, Y. W., Groves, T. R., Pease, R. F. 1983; 1 (4): 1141-1144
  • VLSI LITHOGRAPHY FOR THE 80S ISSCC DIGEST OF TECHNICAL PAPERS Joy, R. C., ABRAHAM, H. E., GROBMAN, W. D., KING, M. C., Lepselter, M. P., Oldham, W. G., Pease, R. F., Terman, L. M., VARNELL, G. L. 1982; 25: 222-223
  • LOW-ENERGY ELECTRON-BEAM LITHOGRAPHY PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS POLASKO, K. J., YAU, Y. W., Pease, R. F. 1982; 333: 76-82
  • SPECIAL ISSUE ON HIGH-RESOLUTION FABRICATION OF ELECTRON DEVICES - FORWORD IEEE TRANSACTIONS ON ELECTRON DEVICES Pease, R. F. 1981; 28 (11): 1267-1267
  • ELECTRON-BEAM LITHOGRAPHY CONTEMPORARY PHYSICS Pease, R. F. 1981; 22 (3): 265-290
  • GENERATION AND APPLICATIONS OF FINELY FOCUSED BEAMS OF LOW-ENERGY ELECTRONS JOURNAL OF VACUUM SCIENCE & TECHNOLOGY YAU, Y. W., Pease, R. F., IRANMANESH, A. A., POLASKO, K. J. 1981; 19 (4): 1048-1052
  • LATERAL EPITAXIAL RECRYSTALLIZATION OF DEPOSITED SILICON FILMS ON SILICON DIOXIDE JOURNAL OF THE ELECTROCHEMICAL SOCIETY Kamins, T. I., CASS, T. R., DELLOCA, C. J., Lee, K. F., Pease, R. F., Gibbons, J. F. 1981; 128 (5): 1151-1154
  • HIGH-PERFORMANCE HEAT SINKING FOR VLSI ELECTRON DEVICE LETTERS TUCKERMAN, D. B., Pease, R. F. 1981; 2 (5): 126-129
  • SCANNING-ELECTRON-BEAM ANNEALING OF ARSENIC-IMPLANTED SILICON APPLIED PHYSICS LETTERS Regolini, J. L., Gibbons, J. F., Sigmon, T. W., Pease, R. F., Magee, T. J., Peng, J. 1979; 34 (6): 410-412