Shi-Xi Kong
Ph.D. Student in Electrical Engineering, admitted Autumn 2026
Bio
Shi-Xi Kong is an incoming EE PhD student at Stanford. His research interest lies in translating scientific insights into practical device technologies for logic, memory, and emerging computing paradigms.
Over the past three years, as a undergraduate research assistant at NYCU, he worked on emerging memory devices such as FTJ and STT-MRAM, focusing on their device physics and applications.
He is now studying trap-assisted tunneling and quantum transport at 2D contacts.
Honors & Awards
-
Stanford Graduate Fellowship, Stanford University (2026 – 2029)
-
TSMC-NYCU Research Assistantship, TSMC-NYCU Joint Research Center (2023 – 2024)
All Publications
-
Theoretical investigation of performance-improved ferroelectric tunnel junction based on trap-assisted tunneling
APPLIED PHYSICS LETTERS
2025; 127 (26)
View details for DOI 10.1063/5.0301173
View details for Web of Science ID 001651250100017
https://orcid.org/0009-0005-5678-2341