Yu-Chuan Hao
Masters Student in Electrical Engineering, admitted Autumn 2026
Work Experience
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Engineer, Taiwan Semiconductor Manufacturing Company (March 22, 2021)
Semiconductor R&D engineer at TSMC with five years of experience in advanced semiconductor test hardware development.
My work focused on probe card and test interface design, signal and power integrity, and bring-up activity across circuit probing (CP), wafer-level circuit probing (WLCP), and final test (FT) for leading-edge semiconductor products.Location
Hsinchu
All Publications
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Thermal stability and microstructural evolution of nanotwinned Ag thin films: Downward grain growth and annealing nanotwin formation
SURFACE & COATINGS TECHNOLOGY
2026; 532
View details for DOI 10.1016/j.surfcoat.2026.133587
View details for Web of Science ID 001780316100001
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Improvement of thermomigration resistance in lead-free Sn3.5Ag alloys by Ag interlayer
JOURNAL OF ALLOYS AND COMPOUNDS
2020; 847
View details for DOI 10.1016/j.jallcom.2020.156429
View details for Web of Science ID 000573225700005
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Application of Atmospheric-Pressure-Plasma-Jet Modified Flexible Graphite Sheets in Reduced-Graphene-Oxide/Polyaniline Supercapacitors.
Polymers
2020; 12 (6)
Abstract
In this study, flexible and low-cost graphite sheets modified by atmospheric pressure plasma jet are applied to reduced-graphene-oxide/polyaniline supercapacitors. Surface treatment by atmospheric pressure plasma jet can make the hydrophobic surface of graphite into a hydrophilic surface and improve the adhesion of the screen-printed reduced-graphene-oxide/polyaniline on the graphite sheets. After the fabrication of reduced-graphene-oxide/polyaniline supercapacitors with polyvinyl alcohol/H2SO4 gel electrolyte, pseudo-capacitance and electrical double capacitance can be clearly identified by the measurement of cyclic voltammetry. The fabricated supercapacitor exhibits specific capacitance value of 227.32 F/g and areal capacitance value of 28.37 mF/cm2 with a potential scan rate of 2 mV/s. Meanwhile, the capacitance retention rate can reach 86.9% after 1000-cycle cyclic voltammetry test. A light-emitting diode can be lit by the fabricated reduced-graphene-oxide/polyaniline supercapacitors, which confirms that the supercapacitors function well and can potentially be used in a circuit.
View details for DOI 10.3390/polym12061228
View details for PubMedID 32481643
View details for PubMedCentralID PMC7362246
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Atmospheric-pressure-plasma-jet processed carbon nanotube (CNT)-reduced graphene oxide (rGO) nanocomposites for gel-electrolyte supercapacitors.
RSC advances
2018; 8 (6): 2851-2857
Abstract
This study evaluates DC-pulse nitrogen atmospheric-pressure-plasma-jet processed carbon nanotube (CNT)-reduced graphene oxide (rGO) nanocomposites for gel-electrolyte supercapacitor applications. X-ray photoelectron spectroscopy (XPS) indicates decreased oxygen content (mainly, C-O bonding content) after nitrogen APPJ processing owing to the oxidation and vaporization of ethyl cellulose. Nitrogen APPJ processing introduces nitrogen doping and improves the hydrophilicity of the CNT-rGO nanocomposites. Raman analysis indicates that nitrogen APPJ processing introduces defects and/or surface functional groups on the nanocomposites. The processed CNT-rGO nanocomposites on carbon cloth are applied to the electrodes of H2SO4-polyvinyl alcohol (PVA) gel-electrolyte supercapacitors. The best achieved specific (areal) capacitance is 93.1 F g-1 (9.1 mF cm-2) with 15 s APPJ-processed CNT-rGO nanocomposite electrodes, as evaluated by cyclic voltammetry under a potential scan rate of 2 mV s-1. The addition of rGOs in CNTs in the nanoporous electrodes improves the supercapacitor performance.
View details for DOI 10.1039/c7ra12108c
View details for PubMedID 35541196
View details for PubMedCentralID PMC9077538
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Improved performance of polyaniline/reduced-graphene-oxide supercapacitor using atmospheric-pressure-plasma-jet surface treatment of carbon cloth
ELECTROCHIMICA ACTA
2018; 260: 391-399
View details for DOI 10.1016/j.electacta.2017.12.060
View details for Web of Science ID 000419831600043
https://orcid.org/0009-0007-5581-1272