Stanford Advisors

Contact

  • Academic
    rohiths@stanford.edu
    University - Scholar Department: Electrical Engineering Position: Postdoctoral Scholar

Additional Info

  • Mail Code: 9505

All Publications

  • Low Thermal Budget Growth of Near-Isotropic Diamond Grains for Heat Spreading in Semiconductor Devices ADVANCED FUNCTIONAL MATERIALS Malakoutian, M., Zheng, X., Woo, K., Soman, R., Kasperovich, A., Pomeroy, J., Kuball, M., Chowdhury, S. 2022

    View details for DOI 10.1002/adfm.202208997

    View details for Web of Science ID 000854896500001

  • Nanoporous GaN on p-type GaN: A Mg out-diffusion compensation layer for heavily Mg-doped p-type GaN. Nanotechnology Lee, K. J., Nakazato, Y., Chun, J., Wen, X., Meng, C., Soman, R., Noshin, M., Chowdhury, S. 2022

    Abstract

    Embeddingp-type gallium nitride (p-GaN) with controlled Mg out-diffusion in adjacent epitaxial layers is a key for designing various multi-junction structures with high precision and enabling more reliable bandgap engineering of III-nitride-based optoelectronics and electronics. Here, we report, for the first time, with experimental evidence how nanoporous GaN (NP GaN) can be introduced as a compensation layer for the Mg out-diffusion fromp-GaN. NP GaN onp-GaN provides an ex-situ-formed interface with oxygen and carbon impurities, compensating Mg out-diffusion fromp-GaN. To corroborate our findings, we used two-dimensional electron gas (2DEG) formed at the interface of AlGaN/GaN as the indicator to study the impact of the Mg out-diffusion from underlying layers. Electron concentration evaluated from the capacitance-voltage measurement shows that 9 * 1012cm-2of carriers accumulate in the AlGaN/GaN 2DEG structure grown on NP GaN, which is the almost same number of carriers as that grown with nop-GaN. In contrast, 2DEG onp-GaN without NP GaN presents 9 * 109cm-2of the electron concentration, implying 2DEG structure is depleted by Mg out-diffusion. The results address the efficacy of NP GaN and its' role in successfully embeddingp-GaN in multi-junction structures for various state-of-the-art III-nitride-based devices.

    View details for DOI 10.1088/1361-6528/ac91d7

    View details for PubMedID 36103775

  • Vertical Ga2O3 MOSFET With Magnesium Diffused Current Blocking Layer IEEE ELECTRON DEVICE LETTERS Zeng, K., Soman, R., Bian, Z., Jeong, S., Chowdhury, S. 2022; 43 (9): 1527-1530

    View details for DOI 10.1109/LED.2022.3196035

    View details for Web of Science ID 000845067200038

  • A study on MOCVD growth window for high quality N-polar GaN for vertical device applications SEMICONDUCTOR SCIENCE AND TECHNOLOGY Soman, R., Noshin, M., Chowdhury, S. 2022; 37 (9)

    View details for DOI 10.1088/1361-6641/ac7e67

    View details for Web of Science ID 000829564000001

  • A systematic study of the regrown interface impurities in unintentionally doped Ga-polar c-plane GaN and methods to reduce the same SEMICONDUCTOR SCIENCE AND TECHNOLOGY Noshin, M., Soman, R., Xu, X., Chowdhury, S. 2022; 37 (7)

    View details for DOI 10.1088/1361-6641/ac71bf

    View details for Web of Science ID 000807760500001